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Metal oxide films

  • US 4,065,600 A
  • Filed: 05/18/1971
  • Issued: 12/27/1977
  • Est. Priority Date: 05/20/1970
  • Status: Expired due to Term
First Claim
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1. A method of depositing a transparent electrically conductive metal oxide coating by reactive sputtering onto the surface of a substrate, wherein:

  • the substrate is supported, in spaced relationship with a cathode which is to be sputtered, in a vacuum chamber containing an atmosphere comprising an inert gas and a controlled oxygen concentration at a selected reduced total pressure, the substrate is heated prior to sputtering to a selected elevated temperature, and reactive sputtering is caused by applying a selected negative potential to the cathode relative to the substrate, the oxygen in the atmosphere being provided and maintained at a selected concentration, and the heating of said substrate being controlled during sputtering to maintain said substrate temperature substantially constant at said selected temperature during heating of said substrate caused by sputtering, the selected values of the oxygen concentration, substrate temperature, vacuum chamber pressure, and cathode potential being so chosen that the deposited coating is haze-free, and its specific electrical resistivity lies at or close to the minimum of the curve which is obtained by plotting specific electrical resistivity against oxygen concentration while maintaining the substrate temperature, vacuum chamber pressure and cathode potential all constant at said selected values.

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