Photocurable epoxy compositions containing group Va onium salts
First Claim
1. Photocurable compositions consisting essentially ofA. an epoxy resin polymerizable to a higher molecular weight state, andB. an effective amount of a photodecomposable aromatic onium salt of a Group Va element capable of effecting the cure of (A) when exposed to radiant energy where the photodecomposable aromatic onium salt of a Group Va element has the formula,
where R is a monovalent aromatic organic radical selected from carbocyclic radicals and heterocyclic radicals, R1 is a monovalent organic aliphatic radical selected from alkyl, alkoxy, cycloalkyl and substituted derivatives thereof, R2 is a polyvalent organic radical forming an aromatic heterocyclic or fused ring structure with X, X is a Group Va element selected from N, P, As, Sb and Bi, M is a metal or metalloid, Q is a halogen radical, a is a whole number equal to 0 to 4 inclusive, b is a whole number equal to 0 to 2 inclusive, c is a whole number equal to 0 to 2 inclusive, and the sum of a + b + c is a value equal to 4 or the valence of X,d = e - ff = valence of M and is an integer equal to from 2 to 7 inclusivee is >
f and is an integer having a value up to 8.
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Abstract
Cationic polymerization of epoxy resin such as epoxy monomers or prepolymers, can be achieved by use of certain radiation sensitive aromatic onium salts of Group Va elements. Curable compositions are provided which can be used as sealants, coating compounds, encapsulants, etc.
209 Citations
18 Claims
- 1. Photocurable compositions consisting essentially of
A. an epoxy resin polymerizable to a higher molecular weight state, and B. an effective amount of a photodecomposable aromatic onium salt of a Group Va element capable of effecting the cure of (A) when exposed to radiant energy where the photodecomposable aromatic onium salt of a Group Va element has the formula, - space="preserve" listing-type="equation">[(R).sub.a (R.sup.1).sub.b (R.sup.2).sub.c X].sup.+.sub.d [MQ.sub.e ].sup.-(e-f),
where R is a monovalent aromatic organic radical selected from carbocyclic radicals and heterocyclic radicals, R1 is a monovalent organic aliphatic radical selected from alkyl, alkoxy, cycloalkyl and substituted derivatives thereof, R2 is a polyvalent organic radical forming an aromatic heterocyclic or fused ring structure with X, X is a Group Va element selected from N, P, As, Sb and Bi, M is a metal or metalloid, Q is a halogen radical, a is a whole number equal to 0 to 4 inclusive, b is a whole number equal to 0 to 2 inclusive, c is a whole number equal to 0 to 2 inclusive, and the sum of a + b + c is a value equal to 4 or the valence of X, d = e - f f = valence of M and is an integer equal to from 2 to 7 inclusive e is >
f and is an integer having a value up to 8.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
Specification
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- Resources
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Current AssigneeGeneral Electric Company
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Original AssigneeGeneral Electric Company
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InventorsCrivello, James V.
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Primary Examiner(s)Brammer, Jack P.
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Application NumberUS05/638,994Time in Patent Office770 DaysField of Search96/115 P, 96/115 R, 204/159.18, 204/159.23, 204/159.24, 204/159.14, 260/2 EP, 260/2 EC, 260/47 EC, 260/47 EN, 106/20US Class Current430/280.1CPC Class CodesC07C 381/12 Sulfonium compoundsC07F 9/68 without As—C bondsC07F 9/902 Compounds without antimony-...C08F 236/16 containing halogenC08G 59/68 characterised by the cataly...C08G 65/105 Onium compoundsC08G 85/00 General processes for prepa...C08L 61/00 Compositions of condensatio...C08L 61/06 of aldehydes with phenolsG03F 7/029 Inorganic compounds; Onium ...Y10S 430/115 Cationic or anionic
