Gas scrubbing system
First Claim
1. A corrosion inhibited aqueous N-methyldiethanolamine or diethanolamine acid gas treating solution consisting essentially of (1) an amine compound or mixture of compounds having the formula ##STR3## wherein n is an integer from 1 to 3, m is an integer 2 to an integer to yield a molecular weight of about 800 and each R represents a member selected from the group consisting of --H, --Cn,H2n'"'"',OH, Cn,H2n'"'"', or --Cn,H2n'"'"',N(R3)R4, n'"'"' is an integer from 1 to 2, and wherein R1 R3 and R2 R4 are joined together and n'"'"' is 2;
- said compound being present in about 10 to about 2000 parts per million parts treating solution;
(2) copper or a copper ion yielding compound in from 0 to 1000 ppm; and
(3) sulfur or a sulfur atom yielding compound in from 0 to 1000 ppm.
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Abstract
An aqueous organic amine acid gas scrubbing system, particularly an aqueous N-methyldiethanolamine or diethanolamine acid gas scrubbing system having incorporated therein (1) a compound or mixture of compounds having the formula ##STR1## wherein n is an integer from 1 to 3, m is an integer from 2 to a number sufficient to yield a molecular weight of about 800, R1, R2, R3 and R4 are each independently selected from the group consisting of --H, --Cn'"'"' H2n'"'"' OH, --Cn'"'"' H2n'"'"'+1, --Cn'"'"' H2n'"'"' N(R3)R4 wherein n'"'"' is an integer from 1 to 2 and wherein R1 -R3 and R2 -R4 may be joined to form cyclic amines when n is 2; said compound being present in about 10 to about 2000 parts per million parts of treating solution; (2) copper or a copper ion yielding compound in from 0 to 1000 ppm; and (3) sulfur or a sulfur atom yielding compound in from 0 to 1000 ppm.
39 Citations
15 Claims
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1. A corrosion inhibited aqueous N-methyldiethanolamine or diethanolamine acid gas treating solution consisting essentially of (1) an amine compound or mixture of compounds having the formula ##STR3## wherein n is an integer from 1 to 3, m is an integer 2 to an integer to yield a molecular weight of about 800 and each R represents a member selected from the group consisting of --H, --Cn,H2n'"'"',OH, Cn,H2n'"'"', or --Cn,H2n'"'"',N(R3)R4, n'"'"' is an integer from 1 to 2, and wherein R1 R3 and R2 R4 are joined together and n'"'"' is 2;
- said compound being present in about 10 to about 2000 parts per million parts treating solution;
(2) copper or a copper ion yielding compound in from 0 to 1000 ppm; and
(3) sulfur or a sulfur atom yielding compound in from 0 to 1000 ppm. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
- said compound being present in about 10 to about 2000 parts per million parts treating solution;
Specification