Nonreflecting photoresist process

• US 4,102,683 A
• Filed: 02/10/1977
• Issued: 07/25/1978
• Est. Priority Date: 02/10/1977
• Status: Expired due to Term

• Current Assignee: RCA Corporation
• Original Assignee: RCA Corporation
• Inventors: DiPiazza, James John
• Primary Examiner(s): Welsh, John D.
• Application Number:
  US05/767,479
• Time in Patent Office: 530 Days
• Field of Search: 96/27 R, 96/84 M, 96/38.3, 96/38.4, 96/84 A, 350/164
• US Class Current: 430/319
• CPC Class Codes: G03F 7/091 characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Abstract

A light absorbing medium is interposed between a photosensitive layer, such as a photoresist layer, and the surface upon which the photosensitive layer is to be applied in order to eliminate surface effects which result from the reflection of light which passes through the photosensitive layer and is then reflected upward from the surface back into the photosensitive layer. The light absorbing medium may be either a quarter-wave plate or a filter chosen to absorb light of the energy spectrum to which the photosensitive layer is sensitive.

Claims

1. An improved photolithographic method for defining a pattern of a photoresist layer which overlies a material, said photoresist layer being sensitive to light of a particular peak wavelength, the method being of the type which includes the step of exposing said photosensitive layer to a pattern of light having a frequency distribution which includes said peak wavelength, wherein the improvement comprises:

applying a light absorbing layer comprising a fluorescent dye selected to absorb light of said particular peak wavelength and to emit light of a different wavelength which said photoresist layer is not sensitive to between said material and said photoresist layer prior to said step of exposing whereby light of said particular peak wavelength which passes through said photoresist layer during said step of exposing will be absorbed by said light absorbing layer and not reflected back into said photoresist layer.