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Method of making a negative photoresist image

  • US 4,104,070 A
  • Filed: 05/03/1976
  • Issued: 08/01/1978
  • Est. Priority Date: 06/30/1975
  • Status: Expired due to Term
First Claim
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1. A method of making a negative photoresist image on a substrate consisting essentially of the steps of:

  • Applying to a substrate a layer of a positive working photoresist material consisting essentially of a phenolformaldehyde resin, a naphthoquinone (1,2) diazide sulfonic acid ester sensitizer, and a 1-hydroxyethyl-2-alkylimidazoline,imagewise exposing the layer with actinic radiation,heating the imagewise exposed layer for a sufficient period of time to a sufficient temperature to render the exposed areas insoluble in alkaline developer,subsequently blanket exposing the layer with actinic radiation and, removing the portions of the layer which were not exposed during the imagewise exposure with an alkaline developer.

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