Crossovers and method of fabrication

• US 4,118,595 A
• Filed: 06/06/1977
• Issued: 10/03/1978
• Est. Priority Date: 06/06/1977
• Status: Expired due to Term

• Current Assignee: Bell Telephone Laboratories, Inc. (Nokia Corporation)
• Original Assignee: Bell Telephone Laboratories, Inc. (Nokia Corporation)
• Inventors: Pfahnl, Arnold, Schuller, Joris Maarten
• Primary Examiner(s): Truhe, J. V.
• Assistant Examiner(s): Bouchard, J. H.
• Application Number:
  US05/803,802
• Time in Patent Office: 484 Days
• Field of Search: 174/68.5, 174/52 PE
• US Class Current: 174/256
• CPC Class Codes: H01L 23/5381 Crossover interconnections, e.g. bridge stepovers
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
• CPC Class Codes: H01L 2924/09701 Low temperature co-fired ceramic [LTCC]
• CPC Class Codes: H05K 3/4685 Manufacturing of cross-over conductors

Abstract

Disclosed is a crossover structure and method of fabricating such crossovers in microelectronic circuits. The invention utilizes as a separator between the crossover beam and the conductor on the substrate a mixture of at least 50 percent by weight of fine grain SiO₂ and an organic dielectric. For high temperature curing, this dielectric can be a silicone resin. For metallization systems which are sensitive to high temperatures, the dielectric can be a low temperature or ultra-violet curing organic material, such as an epoxy. The crossover processing is simplified by fabricating the beam crossover in direct contact with the insulating layer.

Claims

1. In a microelectronic circuit comprising a pair of conductive elements and a conductor therebetween on an insulating substrate, a structure which provides an electrical connection between said pair of conductive elements comprising an insulating layer formed over the conductor between said pair, said insulating layer comprising 50-90% by weight SiO₂ with a particle size of 3 μ

m or less and including 0.5-5% by weight of fumed silica and 10-40% by weight of an organic dielectric, and a crossover conductor formed on said insulating layer making electrical contact between said pair of conductive elements.

2. The circuit according to claim 1 wherein said organic dielectric is a silicone resin.

3. The circuit according to claim 1 wherein said organic dielectric is an epoxy.

4. The circuit according to claim 2 wherein the silicone resin comprises a polymer of the formula ##STR3## where R, R₁ are phenyl, methyl and hydroxyl radicals and n is approximately 10-20.

5. The circuit according to claim 3 wherein the epoxy comprises a polymer of the formula ##STR4## where n is approximately 1-25.

6. The circuit according to claim 1 wherein said crossover conductor consists essentially of copper.

7. A method of forming electrical connectors between a pair of conductive elements and across a conductor therebetween formed on an insulating substrate, comprising the steps of:

screen printing an insulating layer across the conductor to be crossed where said insulating layer comprises 50-90% by weight SiO₂ with a particle size of 3 μ

m or less and including 0.5-5% by weight of fumed silica and 10-40% by weight of an organic dielectric;

curing said insulating layer; and

depositing a crossover conductor over said insulating layer and contacting said pair of conductive elements.

8. The method according to claim 7 wherein the organic dielectric is a silicone resin.

9. The method according to claim 7 wherein the organic dielectric is an epoxy.

10. The method of claim 8 in which said insulating layer before curing additionally comprises 8-30% by weight of di-isopropyl benzene.

11. The method according to claim 7 wherein the crossover conductor is formed by evaporating a first layer of copper over said insulating layer and pair of conductive elements, plating a second copper layer over said first copper layer selectively between said pair of conductive elements such that said copper layers make electrical contact between said pair of conductive elements, and etching said first copper layer in the areas not covered by said second copper layer leaving said first and second copper layers between said conductive elements.

12. The method according to claim 8 further comprising the step of exposing the insulating layer to ultra-violet light after curing said layer so as to increase its resistance to solvents.