Method for coating anti-reflection film on surface of optical material
First Claim
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1. A method for coating an anti-reflection film on the surface of an optical material, comprisinga first step of vacuum-depositing under a first condition of vacuum-deposited a silicon oxide SiO film having a predetermined thickness on said surface of said optical material while said optical material is placed in a vacuum chamber having a first vacuum degree and kept at temperatures below 120°
- C. at which the quality and the shape of said material are not changed, anda second step of vacuum-depositing under a second condition of vacuum-deposition different from said first condition a silicon dioxide SiO2 film having a predetermined thickness on said SiO film while the temperature of said optical material is kept the same as in said first step but said first vacuum degree is changed to a second vacuum degree different from said first vacuum degree.
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Abstract
A method for coating silicon oxide SiO film and silicon dioxide SiO2 film on the surface of transparent optical material of glass or syntheic resin whose refractive indices are varied by changing the condition of vapor-deposition, under a predetermined condition of vapor-deposition so as to form a firm and durable anti-reflection film.
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Citations
2 Claims
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1. A method for coating an anti-reflection film on the surface of an optical material, comprising
a first step of vacuum-depositing under a first condition of vacuum-deposited a silicon oxide SiO film having a predetermined thickness on said surface of said optical material while said optical material is placed in a vacuum chamber having a first vacuum degree and kept at temperatures below 120° - C. at which the quality and the shape of said material are not changed, and
a second step of vacuum-depositing under a second condition of vacuum-deposition different from said first condition a silicon dioxide SiO2 film having a predetermined thickness on said SiO film while the temperature of said optical material is kept the same as in said first step but said first vacuum degree is changed to a second vacuum degree different from said first vacuum degree.
- C. at which the quality and the shape of said material are not changed, and
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2. A method for coating an anti-reflection film on the surface of an optical material, comprising
a first step of vacuum-depositing at a speed of 50-150 nm/min. a silicon oxide SiO film having a thickness of λ - /2 (wavelength λ
= 500-550 nm) on said surface of said optical material while said material is placed in a vacuum chamber having vacuum degrees of 5 ×
10-5 -8 ×
10-6 Torr and kept at temperatures of 20°
-120°
C., anda second step of vacuum-depositing at a speed of 15-40 nm/min. a silicon dioxide SiO2 film having a thickness of λ
/4 (λ
= 500-550 nm) on said SiO film with said temperatures kept the same but said vacuum degrees changed to 2 ×
10-4 -7 ×
10-5 Torr.
- /2 (wavelength λ
Specification
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Current AssigneeHoya Lens Corporation (Hoya Corporation)
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Original AssigneeHoya Lens Corporation (Hoya Corporation)
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InventorsKamiya, Hajime, Onoki, Fumio
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Primary Examiner(s)Smith, Ronald H.
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Assistant Examiner(s)Silverberg, Sam
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Application NumberUS05/504,977Time in Patent Office1,560 DaysField of Search427/167, 427/255, 427/402, 427/166, 427/164, 350/164US Class Current427/164CPC Class CodesC03C 17/3417 all coatings being oxide co...C23C 14/10 Glass or silicaG02B 1/115 Multilayers
