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Insulated gate field effect transistor having a deep channel portion more highly doped than the substrate

  • US 4,132,998 A
  • Filed: 08/29/1977
  • Issued: 01/02/1979
  • Est. Priority Date: 08/29/1977
  • Status: Expired due to Term
First Claim
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1. In a very low conductivity semiconductor bulk of one type conductivity, the combination of at least two spaced terminal electrode regions of the opposite conductivity type communicating with a defined surface of the bulk, a narrow channel portion, comprising an ion-implantation, extending between the two terminal regions, and a region also extending completely between the two terminal regions, said region being located more remote from the defined surface than the channel portion and having the same conductivity as, but to a substantially greater degree than, the substrate, said region extending to a greater depth from the surface than at least one of said terminal electrode regions, but said region not extending under either of said two spaced terminal electrode regions.

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