Coating method and composition using cationic photoinitiators polythio components and polyolefin components
First Claim
1. A UV curable composition substantially free of a free radical inhibitor consisting essentially of(A) A polyolefin component having the formula,
where x is an integer having a value of at least 2, A is a polyvalent organic radical or an organisilicon radical free of reactive olefinic unsaturation and consisting essentially of chemically combined atoms selected from the class consisting of carbon, oxygen, nitrogen, phosphorous, silicon and mixtures thereof in combination with monovalent atoms selected from the class consisting of chlorine, bromine, fluorine and hydrogen and D is an olefinically unsaturated monovalent organic radical,(B) a polythio component having the formula,
space="preserve" listing-type="equation">G--(SH).sub.y,where G is a polyvalent organic radical free of aliphatic unsaturation and y is an integer having a value of at least 2, and(C) from 0.25% to 10% by weight of the UV curable composition, of a photodecomposable cationic photoinitiator of the formula,
space="preserve" listing-type="equation">(Y.sup.+).sub.j (MX.sub.k).sup.-(k-l),where M is a metal or metalloid and Y+ is a cation selected from the class consisting of
space="preserve" listing-type="equation">[(R).sub.a (R.sup.1).sub.b I].sup.+,
space="preserve" listing-type="equation">[(r).sub.c (R.sup.2).sub.d (R.sup.3).sub.e S].sup.+,and
space="preserve" listing-type="equation">[(R).sub.f (R.sup.4).sub.g (R.sup.5).sub.h Z].sup.+,R is a monovalent aromatic organic radical, R1 is a divalent aromatic organic radical, R2 is a monovalent organic aliphatic radical selected from alkyl, cycloalkyl and substituted alkyl, R3 is a polyvalent organic radical forming a heterocyclic or fused ring structure selected from aliphatic radicals and aromatic radicals, R4 is a monovalent organic aliphatic radical selected from alkyl, alkoxy, cycloalkyl and substituted derivatives thereof, R5 is a polyvalent organic radical forming an aromatic heterocyclic or fused ring structure, X is a halogen radical selected from the class consisting of I, Br, Cl and F, Z is a Group Va element selected from the class consisting of N, P, As, Sb, and Bi, a is a whole number equal to 0 or 2, b is a whole number equal to 0 or 1, the sum of a + b is equal to 2 or the valence of I, c is a whole number equal to 0 or 3, d is a whole number equal to 0 or 2 inclusive, e is a whole number equal to 0 or 1, and the sum of c + d + e is a value equal to 3 or the valence of S, f is a whole number equal to 0 to 4, g is a whole number equal to 0 to 2 inclusive, h is a whole number equal to 0 to 2 inclusive, and the sum of f + g + h is a value equal to 4 or the valence of Z,j = k - ll = valence of M and is an integer equal to 2 to 7 inclusive andk>
l and is an integer having a value up to 8.
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Abstract
A coating method is provided based on the use of a UV curable mixture of a polyolefin and a polythiol having an onium salt photoinitiator. There are also provided, ultraviolet radiation curable compositions useful as coating compositions.
62 Citations
10 Claims
- 1. A UV curable composition substantially free of a free radical inhibitor consisting essentially of
(A) A polyolefin component having the formula, - space="preserve" listing-type="equation">[A] [D].sub.x,
where x is an integer having a value of at least 2, A is a polyvalent organic radical or an organisilicon radical free of reactive olefinic unsaturation and consisting essentially of chemically combined atoms selected from the class consisting of carbon, oxygen, nitrogen, phosphorous, silicon and mixtures thereof in combination with monovalent atoms selected from the class consisting of chlorine, bromine, fluorine and hydrogen and D is an olefinically unsaturated monovalent organic radical, (B) a polythio component having the formula,
space="preserve" listing-type="equation">G--(SH).sub.y,where G is a polyvalent organic radical free of aliphatic unsaturation and y is an integer having a value of at least 2, and (C) from 0.25% to 10% by weight of the UV curable composition, of a photodecomposable cationic photoinitiator of the formula,
space="preserve" listing-type="equation">(Y.sup.+).sub.j (MX.sub.k).sup.-(k-l),where M is a metal or metalloid and Y+ is a cation selected from the class consisting of
space="preserve" listing-type="equation">[(R).sub.a (R.sup.1).sub.b I].sup.+,
space="preserve" listing-type="equation">[(r).sub.c (R.sup.2).sub.d (R.sup.3).sub.e S].sup.+,and
space="preserve" listing-type="equation">[(R).sub.f (R.sup.4).sub.g (R.sup.5).sub.h Z].sup.+,R is a monovalent aromatic organic radical, R1 is a divalent aromatic organic radical, R2 is a monovalent organic aliphatic radical selected from alkyl, cycloalkyl and substituted alkyl, R3 is a polyvalent organic radical forming a heterocyclic or fused ring structure selected from aliphatic radicals and aromatic radicals, R4 is a monovalent organic aliphatic radical selected from alkyl, alkoxy, cycloalkyl and substituted derivatives thereof, R5 is a polyvalent organic radical forming an aromatic heterocyclic or fused ring structure, X is a halogen radical selected from the class consisting of I, Br, Cl and F, Z is a Group Va element selected from the class consisting of N, P, As, Sb, and Bi, a is a whole number equal to 0 or 2, b is a whole number equal to 0 or 1, the sum of a + b is equal to 2 or the valence of I, c is a whole number equal to 0 or 3, d is a whole number equal to 0 or 2 inclusive, e is a whole number equal to 0 or 1, and the sum of c + d + e is a value equal to 3 or the valence of S, f is a whole number equal to 0 to 4, g is a whole number equal to 0 to 2 inclusive, h is a whole number equal to 0 to 2 inclusive, and the sum of f + g + h is a value equal to 4 or the valence of Z, j = k - l l = valence of M and is an integer equal to 2 to 7 inclusive and k>
l and is an integer having a value up to 8.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
Specification
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- Resources
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Current AssigneeGeneral Electric Company
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Original AssigneeGeneral Electric Company
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InventorsCrivello, James V.
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Primary Examiner(s)Brammer, Jack P.
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Application NumberUS05/759,327Time in Patent Office760 DaysField of Search96/115 P, 96/115 R, 204/159.18, 204/159.23, 204/159.24US Class Current427/518CPC Class CodesC08G 75/045 from mercapto compounds and...C08G 75/12 Polythioether-ethers C08G75...G03F 7/0275 with dithiol or polysulfide...G03F 7/029 Inorganic compounds; Onium ...
