Apparatus and method for aligning wafers

• US 4,141,456 A
• Filed: 08/30/1976
• Issued: 02/27/1979
• Est. Priority Date: 08/30/1976
• Status: Expired due to Term

• Current Assignee: RCA Corporation (General Electric Company)
• Original Assignee: RCA Corporation (General Electric Company)
• Inventors: Hart, Lewis F.
• Primary Examiner(s): Werner, Frank E.
• Application Number:
  US05/718,825
• Time in Patent Office: 911 Days
• Field of Search: 214/1 R, 214/1 BB, 214/1 BT, 214/309, 214/1 C, 214/1 Q, 214/152, 214/1 BS, 29/407, 29/760, 29/743, 29/759, 29/740, 29/721, 29/599, 29/430, 29/468, 29/406, 29/739, 29/271, 219/158, 219/121 L, 219/121 LM, 269/58-60, 269/21, 279/3, 294/64 R, 294/64 A, 294/64 B
• US Class Current: 414/787
• CPC Class Codes: H05K 13/0015 Orientation; Alignment; Positioning
• CPC Class Codes: Y10T 29/49762 Center locating and shaping
• CPC Class Codes: Y10T 29/53191 Means to apply vacuum directly to position or hold work part
• CPC Class Codes: Y10T 29/53261 Means to align and advance work part
• CPC Class Codes: Y10T 29/53913 Aligner or center

Abstract

The device includes an alignment station at which an operator can align a wafer under a microscope. Once the wafer is properly aligned, a transfer chuck is brought into position above the wafer and aligned with alignment pins located in fixed positions at the alignment station. The wafer is then fixed to the transfer chuck and released from the alignment station. The transfer chuck is moved into proper alignment with alignment pins at a remote operation station, such as an automatic scribing station. The invention allows the operator to view the wafer with semiconductor devices facing the operator and provides for flipping the wafer over through the use of the transfer chuck so that the laser scriber can scribe the wafer on the side away from the semiconductor devices.

Claims

1. An apparatus for aligning wafers comprising:

(a) an alignment station including means for contacting and selectively holding a wafer in a fixed position;

(b) a transfer chuck including means for contacting and selectively holding said wafer in a fixed position, said transfer chuck being separate and distinct from said alignment station;

(c) means associated with said alignment station for receiving said transfer chuck in a predetermined orientation;

(d) a microscope located in a fixed position relative to said alignment station in order that an operator will view and then align a wafer positioned at said alignment station relative to reference lines in said microscope; and

(e) a remote operation station including means for contacting and selectively holding said wafer in a fixed position as well as means for receiving said transfer chuck in a predetermined orientation.

2. The apparatus of claim 1 in which said means for selectively holding a wafer at said alignment station comprises a compound capable of moving said wafer in the x and y directions.

3. The apparatus of claim 2 further comprising a wafer holder which fits into said compound and which may be rotated or removed in any direction on said compound.

4. The apparatus of claim 3 in which said wafer holder has a bevelled edge to facilitate movement by said operator.

5. The apparatus of claim 1 wherein said means for selectively holding a wafer includes means for selectively subjecting said wafer to a pressure less than atmospheric pressure whereby said wafer is held in a fixed position by atmospheric pressure.

6. The apparatus of claim 1 wherein said means for selectively holding said wafer included in said transfer chuck comprises means for subjecting said wafer to a pressure less than atmospheric pressure whereby said wafer will be held in a fixed position on said transfer chuck by atmospheric pressure.

7. The apparatus of claim 1 wherein said means associated with said alignment station for receiving said transfer chuck comprises a set of alignment pins which contact the edges of said transfer chuck.

8. The apparatus of claim 1 wherein said means for selectively holding said wafer at said remote operation station comprises means for subjecting said wafer to a pressure less than atmospheric pressure whereby said wafer will be held in a fixed position by atmospheric pressure.

9. The apparatus of claim 1 wherein said means for receiving said transfer chuck at said remote operation station includes alignment pins which contact the edge of said transfer chuck in a predetermined orientation of said transfer chuck.

10. The apparatus of claim 1 wherein said microscope is a split image microscope.

11. A method of aligning a wafer comprising the steps of:

(a) placing a wafer onto means for selectively holding said wafer at an alignment station where it can be viewed by an operator through a microscope having alignment indicia therein;

(b) adjusting the position of said means for selectively holding said wafer to cause selected portions of said wafer to coincide with said indicia;

(c) fixing the position of said means for selectively holding said wafer at said alignment station;

(d) moving a transfer chuck into position over said wafer and in contact with alignment pins in fixed positions relative to said wafer;

(e) lowering said transfer chuck onto said wafer while keeping said transfer chuck in contact with said alignment pins;

(f) attaching said transfer chuck to said wafer;

(g) releasing said wafer from said means for selectively holding said wafer at said alignment station;

(h) moving said transfer chuck into position at a remote operation station and in contact with a set of alignment pins;

(i) lowering said transfer chuck into position at a remote operation station while keeping said transfer chuck in contact with said alignment pins;

(j) attaching said transfer chuck to said remote operation station.