Semiconductor wafer polishing machine and wafer carrier therefor

• US 4,194,324 A
• Filed: 01/16/1978
• Issued: 03/25/1980
• Est. Priority Date: 01/16/1978
• Status: Expired due to Term

• Current Assignee: Cybeq Nano Technologies, Inc.
• Original Assignee: Siltec Corporation
• Inventors: Lorenz, Karl, Bonora, Anthony C.
• Primary Examiner(s): Whitehead, Harold D.
• Assistant Examiner(s): Olszewski, Robert P.
• Application Number:
  US05/869,652
• Time in Patent Office: 799 Days
• Field of Search: 51/131 R, 51/131 A, 51/131 B, 51/131 C, 51/131 D, 51/216 R, 51/216 LP, 51/216 T, 51/235, 269/21, 279/3
• US Class Current: 451/289
• CPC Class Codes: B24B 37/30 for single side lapping of plane surfaces
• CPC Class Codes: B24B 41/068 Table-like supports for panels, sheets or the like
• CPC Class Codes: Y10T 279/11 Vacuum

Abstract

A carrier for semiconductor wafers to be polished is described, as well as mounting structure for securing the carrier within a polishing machine. The carrier is a relatively thick metal plate having on one of its faces, a sheet of material to which wafers can be adhered. An annular flange is on its opposite face to receive pressure loading from the polishing machine during the wafer polishing operation. Radially extending webs connect the annular flange with that area of the plate to distribute the pressure loading over substantially the full area of the plate opposed to the area on the opposite face on which wafers are to be adhered. An arrangement is included in the holder of the polishing machine for the carrier which applies a vacuum to the carrier to maintain the carrier selectively on the polishing machine, which arrangement releases the vacuum during the polishing operation and also enables simple intentional removal of the carrier. The carrier holder also enables the orientation of the carrier relative to the remainder of the polishing machine to be angularly tilted in such a manner that the leverage of any tangential force applied to wafers being polished is minimized.

Claims

1. A carrier for thin wafers to be treated comprising:

A. a rigid plate;

B. means on a first face of said plate to adhere thereto one or more wafers to be treated;

C. load bearing means on the side of said plate opposed to said first face to receive loading to press wafers mounted on said first face against a treating means; and

D. load distributing means on said side connecting said load bearing means with substantially the full area of said side opposed to that area of said first face to which wafers are to loading applied to said load bearing means is distributed over said full area;

E. said load bearing means comprising a flange projecting from said side generally centrally with respect to said full area and extending about a generally closed path thereon having a configuration generally the same as the configuration of the outer periphery of said full area, and said load distribution means includes a plurality of webs extending between said flange and said plate side both inwardly and outwardly of said generally closed path.

2. A carrier according to claim 1 combined with apparatus within which one or more thin wafers are to be held for treatment which includes means to mount said carrier to the remainder of said apparatus so as to enable the orientation of said carrier relative to said apparatus to be angularly tilted, said means including a ball and socket joint with the spherical portion of the ball thereof projecting away from said first face and the center of rotation of said joint positioned closely adjacent to said face so that the leverage of any forces projecting tangentially along said face and tending to tilt said carrier with respect to said apparatus is minimized.

3. A carrier according to claim 1 wherein said plate has an air impermeable second surface opposed to said first face and said carrier is combined with apparatus within which one or more thin wafers are to be held for treatment, which apparatus has means to mount said carrier to the remainder of said apparatus that includes:

A. a source of vacuum; and

B. a carrier holder providing a surface adapted to hermetically engage said second surface of said carrier and having a passage for communicating said source of vacuum with the interface of said holder surface and said carrier second surface to apply said vacuum thereto.

4. A carrier according to claim 3 further including means to release the application of vacuum to said interface whenever wafers mounted on said first face are pressed against said treatment means.

5. A carrier according to claim 3 further including means to release the application of vacuum to said interface upon said carrier being angularly tilted with respect to the remainder of said apparatus.

6. A carrier according to claim 1 wherein said plate is of a thermally conductive material and said webs extending outwardly of said flange act as heat dissipating fins to dissipate any heat conducted through said plate to said side.

7. A carrier according to claim 6 wherein said means to adhere one or more wafers to be treated to said first face of said plate includes a sheet of thermal insulating material interposed between said thermally conductive plate and the location at which wafers are to be positioned for treating.

8. A carrier according to claim 1 wherein said plate is a disc, said flange is annular, and said webs extend from said flange both radially inwardly and outwardly of said disc connecting said flange to said second face.

11. A carrier according to claim 2 wherein said load bearing flange circumscribes said ball and socket joint.

9. In apparatus within which one or more thin wafers are to be held for treatment:

A. a carrier having;

(1) a first face to which said wafers are to be adhered for said treatment;

(2) an air impermeable surface; and

(3) load bearing means on the side of said plate opposed to said first face to receive loading to press wafers mounted on said first face against a treating means; and

B. means to mount said carrier to remainder of said apparatus including;

(1) a source of vacuum;

(2) a carrier holder having a surface adapted to hermetically engage said second surface of said carrier and a passage to communicate said source of vacuum with the interface of said holder surface and said carrier surface to apply said vacuum thereto; and

(3) means which responds automatically to the application of loading to said load bearing means to press wafers mounted on said first face against said treating means, by releasing the application of vacuum to said interface.

10. In apparatus according to claim 9 further including means to release the application of vacuum to said interface upon said carrier being angularly tilted with respect to the remainder of said apparatus.