Apparatus for automatic lapping control

• US 4,199,902 A
• Filed: 02/09/1979
• Issued: 04/29/1980
• Est. Priority Date: 07/17/1978
• Status: Expired due to Term

• Current Assignee: Transat Corporation
• Original Assignee: Franz L. Sauerland
• Inventors: Sauerland, Franz L.
• Primary Examiner(s): Whitehead, Harold D.
• Application Number:
  US06/010,983
• Time in Patent Office: 445 Days
• Field of Search: 51/165 R, 51/283 R, 51/118, 318/607, 318/653
• US Class Current: 451/1
• CPC Class Codes: B24B 37/08 for double side lapping

Abstract

Apparatus for automatic lapping control, based on imbedding an electrode of special construction in a lapping plate of a lapping machine, including at least one piezoelectric wafer in the lapping load, sensing the resonance frequency of the piezoelectric wafers as they pass by the electrode, and automatically terminating the lapping when the resonance frequency equals or exceeds a target frequency; the special electrode construction comprising a facing of a dielectric material with a high dielectric constant and surrounded by an insulator having a low dielectric constant and an average wall thickness larger than its wall thickness at the surface of the lapping plate.

Claims

1. Control apparatus for a machine for lapping wafers, having at least one piezoelectric wafer, comprising:

a. at least a first and second electrode means in and isolated from said lapping plate, said first and second electrode means being spaced in close proximity to each other and being faced with a solid dielectric material with a relative dielectric constant larger than 10 and positionable toward the lapping surface;

b. means for sensing the resonance frequency of piezoelectric wafers and means for terminating lapping when said resonance frequency reaches a predetermined relationship with a target frequency.

2. Apparatus according to claim 1, wherein said sensing means is operatively connected with said terminating means for terminating lapping automatically.

3. Apparatus according to claim 1, wherein said sensing means senses electrical signal changes between one of said electrode means and said lapping plate whereby said resonance frequency is sensed in terms of said signal changes.

4. Apparatus according to claim 1 wherein said first and second electrode means are a dual electrode and wherein said first electrode means is mounted in a dielectric material in said lapping plate and said second electrode means is mounted in dielectric material adjacent said first electrode means.

5. Apparatus according to claim 3, wherein said sensing means is operatively connected with said terminating means for terminating lapping automatically.

6. Apparatus according to claim 1, wherein an electrical swept frequency signal is applied between said first electrode means and said lapping plate, said signal causing piezoelectric vibration in said wafer when it is passing under said electrode means, said piezoelectric vibration in turn producing a corresponding electrical output signal between said second electrode means and said lapping plate, said output signal being maximum at the resonance frequency of the wafer and being applied to sensing and control circuitry serving to automatically terminate lapping when the wafer resonance frequency reaches a desired target frequency.