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Apparatus for detecting defects in patterns

  • US 4,209,257 A
  • Filed: 07/05/1978
  • Issued: 06/24/1980
  • Est. Priority Date: 07/15/1977
  • Status: Expired due to Term
First Claim
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1. An apparatus for detecting defects in patterns, particularly defects in chip patterns of photomasks for use in manufacturing semiconductor integrated circuits comprisingoptically scanning means including first and second lens systems each of which projects a scanning light spot onto a respective one of two identical portions of two patterns to be compared with each other and for scanning simultaneously said portions in a two dimensional scanning mode to produce first and second picture signals corresponding to said two identical pattern portions, respectively;

  • delay means for delaying at least one of said first and second picture signals for a delay time which is varied as a function of a position on the two dimensional scanning plane so as to decrease a relative deviation of the picture signals mainly due to a difference in distortion and/or magnification between the first and second lens systems; and

    means for receiving output picture signals from said delay means and forming a difference between these picture signals to produce a defect signal.

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