Reactants delivery system for optical waveguide manufacturing

• US 4,212,663 A
• Filed: 01/26/1978
• Issued: 07/15/1980
• Est. Priority Date: 01/26/1978
• Status: Expired due to Term

• Current Assignee: Corning Glass Works Inc. (Corning Incorporated)
• Original Assignee: Corning Glass Works Inc. (Corning Incorporated)
• Inventors: Aslami, Mohd A.
• Primary Examiner(s): Fisher, Richard V.
• Application Number:
  US05/872,619
• Time in Patent Office: 901 Days
• Field of Search: 65/144, 65/3 A, 65/18, 118/724, 118/726, 427/163, 427/167
• US Class Current: 65/488
• CPC Class Codes: C03B 2207/81 Constructional details of the feed line, e.g. heating, insulation, material, manifolds, filters
• CPC Class Codes: C03B 2207/85 with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
• CPC Class Codes: C03B 2207/86 by bubbling a gas through the liquid
• CPC Class Codes: C03B 37/01413 Reactant delivery systems C03B37/01807 takes precedence; devices therefor in general B01D1/00, B01J4/00
• CPC Class Codes: C03B 37/01807 Reactant delivery systems, e.g. reactant deposition burners
• CPC Class Codes: C23C 16/4482 by bubbling of carrier gas through liquid source material
• CPC Class Codes: C23C 16/4487 by using a condenser

Abstract

Apparatus for forming a vapor of material to be hydrolyzed and/or oxidized and entraining the vapor in a carrier gas. The source material, in liquid form, is pumped to a point in the column above a porous packing. As the liquid progresses downward through the packing, it encounters a rising countercurrent of carrier gas. The source material vaporizes and is delivered to vapor deposition by the carrier gas. The source material vaporized in the apparatus may alternatively be delivered to an externally heated tubular reactor, or to any other kind of chemical vapor deposition (CVD) reactor.

Claims

1. Apparatus for forming particulate material, comprising:

vapor deposition means for receiving at least one source material vapor entrained in a carrier gas and directing the vapor to a substrate to form a layer of material having a predetermined composition;

means for disposing a substrate in proximity to said vapor deposition means for accumulating said material;

a column including a porous packing material disposed therein, said column having an outlet disposed above said packing and in fluid flow communication with said deposition means;

a reservoir in fluid communication with said column for receiving liquid source material flowing through said packing;

pump means coupled between said reservoir and a point in said column for recirculating said source material through said packing;

a source of carrier gas;

means for introducing the carrier gas into said column at a point remote from said outlet for causing said carrier gas to flow through said packing;

whereby the carrier gas entrains vapor of said source material and transports said vapor from said column outlet to said deposition means.

2. Apparatus according to claim 1, wherein said vapor deposition means comprises a flame hydrolysis burner for hydrolyzing said vapor to form a soot.

3. Apparatus according to claim 1, wherein said means for introducing introduces the carrier gas into said column at a point below said packing, and said column outlet is disposed above said packing.

4. Apparatus according to claim 3, further including temperature control means for maintaining said liquid source material in said reservoir at a predetermined temperature.

5. Apparatus according to claim 4, wherein said means for introducing comprises mass flow control means for regulating the flow of the carrier gas.

6. Apparatus according to claim 5, further including a second packing disposed in said column between the point of introduction of said liquid source material and said outlet.

7. Apparatus according to claim 6, further including temperature control means disposed in heat transfer relationship with said second packing for maintaining said second packing at a predetermined temperature.

8. Apparatus according to claim 7, wherein said means for introducing expels carrier gas below the surface of said source material in said reservoir.

9. Apparatus for forming an optical waveguide blank having a radially varying index of refraction, comprising:

vapor deposition means for receiving at least one source material vapor entrained in a carrier gas and directing said vapor towrd a starting member;

means for rotatably disposing a substantially cylindrical starting member in proximity to said vapor deposition means for accumulating source material from said deposition means;

a reservoir for retaining a quantity of the source material in liquid form;

a column disposed above said reservoir and including a porous packing, said column having an outlet disposed above said packing and in fluid flow communication with said deposition means;

pump means for withdrawing the source material from the reservoir and discharging the material into said column at a point above the lowermost end of said packing;

a source of carrier gas;

control means for determining the flow rate of said carrier gas; and

means coupling said control means to said column for introducing carrier gas into said packing at a point below said outlet.

10. Apparatus according to claim 9, wherein said carrier gas is injected into said reservoir below the surface of the source material.

11. Apparatus according to claim 10, further including temperature control means associated with said reservoir for maintaining the source material at a predetermined temperature.

12. Apparatus according to claim 9, wherein said vapor deposition means comprises a flame hydrolysis burner, said burner serving to hydrolyze said vapor to form a glass soot.

13. Apparatus according to claim 11, wherein said control means further comprises a mass flow control for regulating the mass flow rate of said carrier gas into said reservoir.

14. Apparatus according to claim 13, wherein said packing comprises a multiplicity of discrete ceramic elements, said elements having surfaces which are substantially non-porous to the source material.

15. Apparatus according to claim 14, further including second packing means disposed within said column and above the discharge point of said pump means.

16. Apparatus according to claim 15, further including a second temperature control means disposed in heat transfer relation to said second packing for maintaining said second packing at a predetermined temperature.

17. Apparatus according to claim 16, wherein said second temperature is greater than the temperature of the source material in said reservoir.

18. Apparatus for use in a vapor deposition system for forming an optical waveguide blank including deposition means for directing a gaseous stream having a source material entrained in a carrier gas to a substrate, said apparatus comprising:

a column including a porous packing material disposed therein, said column having an outlet disposed above said packing for fluid flow communication with the deposition means;

a reservoir in fluid communication with said column for receiving liquid source material for flowing through said packing;

means coupled between said reservoir and said column for recirculating said source material through said packing; and

means for introducing the carrier gas into said column remote from said outlet for causing the carrier gas to flow through said packing;

whereby the carrier gas entrains vapor of said source material and transports said vapor from said column outlet to said deposition means.

19. Apparatus according to claim 18, wherein said deposition means comprises a flame hydrolysis burner for hydrolyzing said vapor to form a soot.

20. Apparatus according to claim 18, wherein said means for introducing introduces the carrier gas into said column at point below said packing, and said column outlet is disposed above said packing.

21. Apparatus according to claim 18, wherein said means for recirculating comprises a pump.