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Method and apparatus for pattern examination

  • US 4,242,662 A
  • Filed: 03/30/1979
  • Issued: 12/30/1980
  • Est. Priority Date: 10/16/1978
  • Status: Expired due to Term
First Claim
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1. A method of examining a pattern comprising the steps of:

  • (a) detecting a pattern to be examined in accordance with regions of the pattern corresponding to picture elements on scanning lines of a sensor to produce binary video signals respctively from said regions;

    (b) memorizing as parallel information the binary video signals in P shift registers having each Q memory elements, said P shift registers being connected in series via delay circuits each consisting of N-Q memory elements, where N is the number of picture elements on one scanning line, Q<

    N and P<

    N;

    (c) fetching said parallel information for logically processing the same so as to generate examination outputs pertaining to the shape and position of the pattern to be examined, said examination output pertaining to the position of the pattern to be examined including examination outputs concerning vertical and horizontal edges of the pattern; and

    (d) judging the existence of a horizontal edge when defective pattern position data on the basis of detection of vertical edges is obtained from successive scanning lines of less than a predetermined number.

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