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Method of depositing an abrasive layer

  • US 4,260,647 A
  • Filed: 06/13/1979
  • Issued: 04/07/1981
  • Est. Priority Date: 06/13/1979
  • Status: Expired due to Term
First Claim
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1. In a method for depositing a thick, amorphous, continuous layer of SiOx onto a substrate which comprises depositing a series of thin layers by glow discharge of an organosilane and oxygen, interrupting the deposition as required, the improvement which comprises initiating the glow discharge in oxygen after each interruption and prior to a subsequent deposition.

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