Monolithic integrated circuit structure incorporating Schottky contact diode bridge rectifier
First Claim
1. Monolithic integrated circuit structure incorporating a metal-semiconductor rectifying barrier diode bridge comprisinga body of semiconductor material;
- a first sector of said body electrically isolated from the remainder of the body by intervening semiconductor material of one conductivity type;
said first sector includinga first zone of semiconductor material of the opposite conductivity type,a second zone of semiconductor material of the opposite conductivity type,said first and second zones being separated from each other by an intervening barrier of semiconductor material of the one conductivity type;
a first layer of metal-semiconductor rectifying barrier forming metal in contact with said first zone forming a rectifying barrier therebetween;
a second layer of metal-semiconductor rectifying barrier forming metal in contact with said second zone forming a rectifying barrier therebetween;
a second sector of said body electrically isolated from the remainder of the body by intervening semiconductor material of the one conductivity type;
said second sector includinga third zone of semiconductor material of the opposite conductivity type, anda fourth zone of semiconductor material of the opposite conductivity type;
a third layer of metal-semiconductor rectifying barrier forming metal in contact with said third zone forming a rectifying barrier therebetween;
a fourth layer of metal-semiconductor rectifying barrier forming metal in contact with said fourth zone forming a rectifying barrier therebetween;
first connection means in ohmic contact with the first zone of semiconductor material and connected to said third layer of metal;
second connection means in ohmic contact with the second zone of semiconductor material and connected to said fourth layer of metal;
third connection means connected to said first and second layers of metal; and
fourth connection means in ohmic contact with the third and fourth zones of semiconductor material;
whereby a bridge rectifier of four metal-semiconductor rectifying barrier diodes is provided, which in response to an AC voltage across the first and second connection means produces a DC voltage across the third and fourth connection means.
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Accused Products
Abstract
Monolithic integrated circuit structure incorporating a full wave diode bridge rectifier of four Schottky diodes. A body of silicon includes four zones of N-type material. The first and second N-type zones are separated from each other by encircling and intervening P-type material. A third and fourth N-type zones are contiguous. A Schottky barrier is formed adjacent to the surface of each zone by a layer of a mixed silicide of deposited titanium and tungsten. A first conductive member is connected to the N-type material of the first zone and the silicide layer of the third zone. A second conductive member is connected to the N-type material of the second zone and the silicide layer of the fourth zone. A third conductive member is connected in common to the silicide layers on the first and second zones. A fourth conductive member is connected to the N-type material of the third and fourth zones. An AC voltage applied across the first and second conductive members produces a DC voltage across the third and fourth conductive members.
45 Citations
15 Claims
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1. Monolithic integrated circuit structure incorporating a metal-semiconductor rectifying barrier diode bridge comprising
a body of semiconductor material; -
a first sector of said body electrically isolated from the remainder of the body by intervening semiconductor material of one conductivity type; said first sector including a first zone of semiconductor material of the opposite conductivity type, a second zone of semiconductor material of the opposite conductivity type, said first and second zones being separated from each other by an intervening barrier of semiconductor material of the one conductivity type; a first layer of metal-semiconductor rectifying barrier forming metal in contact with said first zone forming a rectifying barrier therebetween; a second layer of metal-semiconductor rectifying barrier forming metal in contact with said second zone forming a rectifying barrier therebetween; a second sector of said body electrically isolated from the remainder of the body by intervening semiconductor material of the one conductivity type; said second sector including a third zone of semiconductor material of the opposite conductivity type, and a fourth zone of semiconductor material of the opposite conductivity type; a third layer of metal-semiconductor rectifying barrier forming metal in contact with said third zone forming a rectifying barrier therebetween; a fourth layer of metal-semiconductor rectifying barrier forming metal in contact with said fourth zone forming a rectifying barrier therebetween; first connection means in ohmic contact with the first zone of semiconductor material and connected to said third layer of metal; second connection means in ohmic contact with the second zone of semiconductor material and connected to said fourth layer of metal; third connection means connected to said first and second layers of metal; and fourth connection means in ohmic contact with the third and fourth zones of semiconductor material; whereby a bridge rectifier of four metal-semiconductor rectifying barrier diodes is provided, which in response to an AC voltage across the first and second connection means produces a DC voltage across the third and fourth connection means. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. Monolithic integrated circuit structure incorporating a metal-semiconductor rectifying barrier diode bridge comprising
a substrate of semiconductor material of one conductivity type; -
a layer of semiconductor material of the opposite conductivity type contiguous the substrate and having a flat planar surface; an isolation barrier of the one conductivity type extending through the layer from the surface to the substrate to form an electrically isolated first sector; a first zone of semiconductor material of the opposite conductivity type within the first sector having a surface area in the surface of the layer; a second zone of semiconductor material of the opposite conductivity type within the first sector having a surface area in the surface of the layer; an isolation barrier of the one conductivity type extending through the layer from the surface to the substrate between the first and second zones to separate the first and second zones from each other; a first layer of metal-semiconductor rectifying barrier forming metal in contact with a portion of the surface area of the first zone forming a rectifying barrier therebetween; a second layer of metal-semiconductor rectifying barrier forming metal in contact with a portion of the surface area of the second zone forming a rectifying barrier therebetween; an isolation barrier of the one conductivity type extending through the layer from the surface to the substrate to form an electrically isolated second sector; a third zone of semiconductor material of the opposite conductivity type within the second sector having a surface area in the surface of the layer; a fourth zone of semiconductor material of the opposite conductivity type within the second sector having a surface area in the surface of the layer; a third layer of metal-semiconductor rectifying barrier forming metal in contact with a portion of the surface area of the third zone forming a rectifying barrier therebetween; a fourth layer of metal-semiconductor rectifying barrier forming metal in contact with a portion of the surface area of the fourth zone forming a rectifying barrier therebetween; first connection means in ohmic contact with the first zone of semiconductor material and connected to said third layer of metal; second connection means in ohmic contact with the second zone of semiconductor material and connected to said fourth layer of metal; third connection means connected to said first and second layers of metal; and fourth connection means in ohmic contact with the third and fourth zones of semiconductor material; whereby a bridge rectifier of four metal-semiconductor rectifying barrier diodes is provided, which in response to an AC voltage across the first and second connection means produces a DC voltage across the third and fourth connection means. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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Specification