Dual gloss coating and process therefor

• US 4,309,452 A
• Filed: 10/01/1980
• Issued: 01/05/1982
• Est. Priority Date: 10/01/1980
• Status: Expired due to Term

• Current Assignee: GAF Corporation (G Holdings Incorporated)
• Original Assignee: GAF Corporation (G Holdings Incorporated)
• Inventors: Sachs, Peter R.
• Primary Examiner(s): Newsome, John H.
• Application Number:
  US06/192,586
• Time in Patent Office: 461 Days
• Field of Search: 427/44, 427/54.1, 204/159.19
• US Class Current: 427/494
• CPC Class Codes: B05D 3/067 Curing or cross-linking the coating
• CPC Class Codes: B05D 3/068 using ionising radiations (gamma, X, electrons)
• CPC Class Codes: B05D 7/546 each layer being cured, at least partially, separately
• CPC Class Codes: B41M 7/0045 using protective coatings or film forming compositions cured by mechanical wave energy, e.g. ultrasonics, cured by electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams, or cured by magnetic or electric fields, e.g. electric discharge, plasma
• CPC Class Codes: B44F 1/02 produced by reflected light, e.g. matt surfaces, lustrous surfaces

Abstract

An article having a dual gloss coating is formed by:

(a) applying a first layer of radiation curable material to a substrate and partially curing with ionizing irradiation or ultraviolet light in an oxygen containing atmosphere; and

(b) then applying a second layer of radiation curable material to selected areas of the first layer and completely curing both the first and second layers with ionizing irradiation or ultraviolet light in an inert atmosphere.

Claims

1. Method of forming a dual gloss coating on a substrate comprising:

(a) applying to the substrate a first layer of radiation curable material and subjecting such layer to ionizing irradiation or ultraviolet light in an atmosphere containing at least about 5,000 ppm oxygen until the radiation curable material is cured except for its surface; and

(b) then applying to selected areas of the surface of the thus partially cured first layer a second layer of the same or a different radiation curable material and subjecting the second layer of material as well as at least the surface of the first layer to ionizing irradiation or ultraviolet light in an inert atmosphere containing less than about 1,000 ppm oxygen to thereby completely cure said second layer and complete the cure of the first layer.

2. Method according to claim 1 wherein radiation curable material of said first and second layers is substantially solvent free.

3. Method of claim 1 wherein the second layer of radiation curable material has a gloss at least about 20 units greater than the material of the first layer.

4. Method according to claim 3 wherein the substrate is an embossed substrate, the first layer of material is applied in a continuous layer and the second layer of material is applied only to non-embossed areas of the substrate.

5. Method according to claim 1, wherein the coating material used for said layers of material comprises in each case fluid urethane compound containing at least two photo-polymerizable ethylenically unsaturated groups of the general structure:

##STR4##

6. Method according to claim 1 wherein each of steps (a) and (b) includes subjecting the radiation curable material to ultraviolet light until a radiation dosage between about 0.2 and 20 megarads has been received by the material.

7. Method according to claim 1 wherein:

(a) radiation curable material of said first and second layers is substantially free of non-reactive solvent;

(b) the second layer of radiation curable material has a gloss at least about 20 units greater than the material of the first layer;

(c) the substrate is an embossed substrate, the first layer of material is applied as a continuous layer and the second layer of material is applied only to non-embossed areas of the substrate;

(d) the coating material used for said layers of material comprises in each case fluid urethane compound containing at least two photo-polymerizable, ethylenically unsaturated groups of the general structure;

##STR5## where R is either H or CH₃, and (e) each of steps (a) and (b) of claim 1 includes subjecting the radiation curable material to ultraviolet light until a radiation dosage between about 0.2 and about 20 megarads has been received by the material.

8. Method according to claim 7 wherein the substrate is vinyl tile base material or sheet vinyl material.