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Method and apparatus for pretreating and depositing thin films on substrates

  • US 4,310,614 A
  • Filed: 03/19/1979
  • Issued: 01/12/1982
  • Est. Priority Date: 03/19/1979
  • Status: Expired due to Term
First Claim
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1. A method for pretreating a glass or plastic surfaced article prior to the deposition of a thin film comprising a coating capable of being ablated upon intense radiation and wherein the molecular characteristic of the thin film to be deposited does not possess good reactive properties with the material of the article to insure an acceptable level of adhesion of the deposited film to the article comprising:

  • providing a chamber,rotatably mounting the article in the chamber,evacuating the chamber,generating a source of high energy ions in the chamber, the energy distribution of the ions being greater than the energy threshold level necessary to induce sputtering of the article, said energy threshold level characteristic of the material comprising the article andfocusing the generated ions into at least one ion beam for bombardment of the article surface and directing the generated ion beam to a sector of the article surface while rotating the article in the chamber, the bombardment of the ions being maintained for a period of time sufficient to create a plurality of nucleation sites uniformly over a majority of the bombarded article surface.

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