Photopolymerizable compositions containing elastomers and photo-curable elements made therefrom

• US 4,320,188 A
• Filed: 10/17/1980
• Issued: 03/16/1982
• Est. Priority Date: 10/18/1979
• Status: Expired due to Term

• Current Assignee: BASF AG (BASF SE)
• Original Assignee: BASF AG (BASF SE)
• Inventors: Richter, Peter, Heinz, Gerhard, Jun, Mong-Jon
• Primary Examiner(s): Brammer, Jack P.
• Application Number:
  US06/197,790
• Time in Patent Office: 515 Days
• Field of Search: 430/281, 430/286, 430/905, 430/910, 204/159.15, 204/159.22
• US Class Current: 430/281.1
• CPC Class Codes: C08F 287/00 Macromolecular compounds obtained by polymerising monomers on to block polymers
• CPC Class Codes: G03F 7/033 the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
• CPC Class Codes: Y10S 430/106 Binder containing
• CPC Class Codes: Y10S 430/111 Polymer of unsaturated acid or ester

Abstract

Photopolymerizable compositions based on an elastomeric styrene-diene block polymer, one or more photopolymerizable olefinically unsaturated monomers and one or more photopolymerization initiators exhibit improved properties if they contain, as an essential constituent, an elastomeric block copolymer of the general structure A-B-C, where A is a thermoplastic, non-elastomeric polymer block based on styrene compounds and having a second order transition point above +25° C., B is an elastomeric polymer block based on butadiene and/or isoprene and having a second order transition point below -20° C. and C is a polymer block, different from B, having a second order transition point of from -30° C. to +15° C., C being either a homopolymer or copolymer block based on butadiene or isoprene or a random copolymer block based on conjugated dienes and styrene compounds. The photopolymerizable compositions may be used, inter alia, for the production of photo-curable adhesives, resilient and flexible sheet material and, in particular, flexographic relief printing plates.

Claims

1. A photopolymerizable composition which contains

(a) not less than 40% by weight of at least one elastomeric block copolymer which is soluble in developer solutions and has the structure A-B-C, where A, B and C are different polymer blocks linked chemically to one another, in which (a1) the polymer block A, accounting for from 5 to 25% by weight of the block copolymer, is prepared by polymerizing at least one styrene monomer of the formula CH₂ ═

CRR'"'"' where R is hydrogen or methyl and R'"'"' is phenyl or C₁ -C₄ -alkyl-substituted phenyl, and has a second order transition point above +25°

C.,

(a2) the polymer block B which accounts for from 15 to 90% by weight of the block copolymer is prepared by polymerizing at least one aliphatic diene hydrocarbon of 4 or 5 carbon atoms and has a second order transition point below -20°

C., and

(a3) the polymer block C which accounts for from 5 to 60% by weight of the block copolymer is prepared by homopolymerization or copolymerization of aliphatic diene hydrocarbons of 4 or 5 carbon atoms or by random copolymerization of at least one aliphatic diene hydrocarbon of 4 or 5 carbon atoms with at least one styrene monomer of the formula CH₂ ═

CRR'"'"', where R is hydrogen or methyl and R'"'"' is phenyl or C₁ -C₄ -alkyl-substituted phenyl, and has a second order transition point of from -20°

C. to +15°

C.

(b) not less than 1% by weight of at least one photopolymerizable olefinically unsaturated monomer compatible with the block copolymer (a) and

(c) from 0.1 to 10% by weight of at least one photopolymerization initiator.

2. A photopolymerizable composition as claimed in claim 1, which contains a block copolymer having the structure A-B-C, in which the polymer block C is incompatible with the polymer block A.

3. A photopolymerizable composition as claimed in claim 1, which contains a block copolymer A-B-C, in which the polymer block C is a polybutadiene block exhibiting more than 70% by weight of 1,2-configuration and having a mean molecular weight of from 10,000 to 90,000.

4. A photopolymerizable composition as claimed in claim 1, which contains a block copolymer A-B-C, in which the polymer block C is a polyisoprene block exhibiting more than 40% by weight of 3,4-configuration and having a mean molecular weight of from 10,000 to 90,000.

5. A photopolymerizable composition as claimed in claim 1, which contains a block copolymer A-B-C, in which the polymer block C is a random copolymer block which contains from 70 to 30% by weight of at least one diene hydrocarbon of 4 or 5 carbon atoms as copolymerized units and from 30 to 70% by weight of a styrene monomer of the formula CH₂ ═

CRR'"'"', where R is hydrogen or methyl and R'"'"' is phenyl or C₁ -C₄ -alkyl-substituted phenyl, as copolymerized units, and which has a second order transition point of from -20°

C. to +15°

C.

6. A photopolymerizable composition as claimed in claim 5, wherein the polymer block C accounts for from 5 to 35% by weight of the block copolymer A-B-C.

7. A photopolymerizable composition as claimed in any of claims 1 to 6, in which the block copolymer A-B-C has an intrinsic viscosity in the range of from about 60 to 350 ml/g, measured on an 0.5% strength by weight solution in toluene at 25°

C.

8. A photopolymerizable composition as claimed in claim 1, which additionally contains admixed compatible tackifying resins.

9. A photopolymerizable composition as claimed in claim 1, which additionally contains admixed plasticizer.

10. Photo-curable elements possessing a photopolymerizable layer on a base, wherein the photopolymerizable layer consists of a photopolymerizable composition as claimed in claim 1.