Coated metal electrode with improved barrier layer

• US 4,331,528 A
• Filed: 10/06/1980
• Issued: 05/25/1982
• Est. Priority Date: 10/06/1980
• Status: Expired due to Term

• Current Assignee: Electrode Corporation
• Original Assignee: Diamond Shamrock Refining and Marketing Company (Valero Energy Corporation)
• Inventors: Hinden, Jean M., Beer, Henri B.
• Primary Examiner(s): Andrews, R. L.
• Application Number:
  US06/194,071
• Time in Patent Office: 596 Days
• Field of Search: 204/38 B, 204/290 F, 204/290 R, 204/98, 204/128, 427/34, 427/423, 427/229, 427/226, 148/6.14 R
• US Class Current: 204/290.08
• CPC Class Codes: C25B 11/091 consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
• CPC Class Codes: C25B 11/093 at least one noble metal or noble metal oxide and at least one non-noble metal oxide

Abstract

An electrode for use in electrolytic processes comprises a substrate of film-forming metal such as titanium having a porous electrocatalytic coating comprising at least one platinum-group metal and/or oxide thereof possibly mixed with other metal oxides, in an amount of at least about 2 g/m² of the platinum-group metal(s) per projected surface area of the substrate. Below the coating is a preformed barrier layer constituted by a surface oxide film grown up from the substrate. This preformed barrier layer has rhodium and/or iridium as metal or compound incorporated in the surface oxide film during formation thereof in an amount of up to 1 g/m² (as metal) per projected surface area of the substrate.

Claims

1. An electrode for use in electrolytic processes comprising:

a film forming metal substrate having a porous electrocatalytic coating comprising at least one of a platinum-group metal and a platinum-group metal oxide in an amount of at least about 2 g/m² over the projected surface area of the substrate, and the substrate having below the coating a preformed barrier layer of a surface oxide film grown up from the substrate and at least one of rhodium and iridium oxides incorporated in the surface oxide film during formation thereof in an amount of up to 1 g/m² on a metal weight basis per projected surface area of the substrate.

2. The electrode of claim 1, wherein the porous electrocatalytic coating consists of a plurality of superimposed layers of micro-cracked configuration.

3. The electrode of claim 2, wherein the porous electrocatalytic coating consists predominantly of a solid-solution of at least one film-forming metal oxide and at least one platinum-group metal oxide.

4. The electrode of claim 3, wherein the porous electrocatalytic coating is a solid solution of ruthenium and titanium oxides having a ruthenium:

titanium atomic ratio of from 1;

1 to 1;

4.

5. The electrode of claim 1, wherein the porous electrocatalytic coating consists predominantly of at least one platinum-group metal.

6. The electrode of claim 5, wherein the porous electrocatalytic coating is a platinum-iridium alloy.

7. The electrode of claim 1, wherein the porous electrocatalytic coating is a plasma-sprayed layer of at least one film-forming metal oxide incorporating at least one of a platinum-group metal and a platinum group metal oxide.

8. The electrode of claim 1, wherein the surface oxide film of the barrier layer contains at least one extra added metal in addition to one of rhodium and iridium but in a lesser amount than the rhodium iridium, the total metal content of the barrier layer being up to 1 g/m².

9. The electrode of claim 8, wherein said film contains up to 0.5 g/m² or iridium and ruthenium in a weight ratio of about 2:

1.

10. The electrode of claim 1, wherein the substrate is titanium and the surface oxide film is predominantly rutile titanium dioxide grown up from the substrate.

26. The electrode of any of claims 1, 22, 23, 24, and 25, wherein the porous electrocatalytic coating comprises a plurality of superimposed layers of micro-cracked configuration.

27. The electrode of claim 26, wherein the porous electrocatalytic coating consists predominantly of a solid-solution of at least one film-forming metal oxide and at least one platinum-group metal oxide.

28. The electrode of claim 27, wherein the porous electrocatalytic coating is a solid-solution of ruthenium and titanium oxides having a ruthenium-titanium atomic ratio of from 1:

1 to 1;

4.

29. The electrode of any of claims 1, 22, 23, 24, and 25, wherein the porous electrocatalytic coating is comprised of more than one platinum-group metal.

30. The electrode of any of claims 1, 22, 23, 24, and 25, wherein the porous electrocatalytic coating is comprised of a platinum-iridium alloy.

31. The electrode of any of claims 1, 22, 23, 24, and 25, wherein the porous electrocatalytic coating is comprised of a plasma-sprayed layer of at least one film-forming metal oxide incorporating at least one of the platinum-group metals and the platinum-group metal oxides thereof.

32. The electrode of any of claims 1, 22, 23, 24, and 25, wherein the surface oxide film of the barrier layer includes at least one metal in addition to at least one of rhodium and iridium but in a lesser amount than the rhodium and iridium with the total metal content of the barrier layer being not more than about 1 g/m².

11. A method of manufacturing an electrode for use in electrolytic processes, comprising forming a barrier layer on a film-forming metal substrate and applying over the barrier layer a porous outer electrocatalytic coating comprising at least one of a platinum-group metal and a platinum group metal oxide, in an amount of at least about 2 g/m² over the projected surface area of the substrate, the barrier layer being formed by applying to the substrate at least one coating of a very dilute acid solution containing thermodecomposable compounds of at least one of rhodium and iridium, separately drying and heating each applied barrier coating to form on the substrate a mixed crystal metal oxide barrier layer of substrate metal oxide and oxide decomposition products of the thermodecomposable compounds contained in the very dilute solution, the number of applied coats being such that the barrier layer so formed contains up to 1.0 g/m² of oxides of the thermodecomposable compounds on a metal weight basis over the projected surface area of the substrate.

12. The method of claim 11, wherein each applied coat of the solution contains up to 0.2 g/m² of rhodium and iridium metal over the projected surface area of the substrate.

21. The electrode produced by the method of any of claims 11 to 20.

13. A method of manufacturing an electrode for use in electrolytic processes, comprising forming a barrier layer on a film-forming metal substrate and applying over the barrier layer a porous outer electrocatalytic coating comprising at least one of a platinum group metal and platinum metal oxide, in an amount of at least about 2 g/m² on a metal weight basis over the projected surface area of the substrate, the barrier layer being formed by applying to the substrate several coatings each containing up to 0.2 g/m² on a metal weight basis over the projected surface area of the substrate of thermodecomposable compounds of at least one of rhodium and iridium in a film-forming metal attacking solution, and drying and heating each coating after application to produce a mixed crystal barrier layer of oxides of the film-forming metal grown up from the substrate up to a total of 1.0 g/m² of iridium and rhodium oxides on a metal weight basis.

14. The method of claim 13, wherein from 2 to 5 coatings of the dilute solution are applied each followed by heating to between about 300°

and 600°

for between about 5 and 15 minutes, the final coat being heated at least as long as previous coatings.

15. The method of claim 13, wherein the heating is carried out to imcompletely decompose the decomposable compound.

16. The method of claim 13, wherein the porous outer electrocatalytic coating is formed by applying over the preformed barrier layer a plurality of coats of a relatively concentrated solution containing a thermodecomposable platinum group metal compound and heating.

17. The method of claim 16, wherein each applied outer coat contains at least 0.4 g/m² of platinum group metal per projected area of the substrate base.

18. The method of claim 13, wherein the porous outer electrocatalytic coating is applied by plasma-spraying.

19. The method of claim 13, wherein the porous outer electrocatalytic coating is applied by plasma spraying at least one film-forming metal oxide over the preformed barrier layer and subsequently incorporating one of the platinum group metal and platinum group metal oxides in the plasma-sprayed film-forming metal oxide.

20. The method of claim 13, wherein a set of electrode substrates are subjected together to a series of pretreatments including etching and formation of the barrier layer by dip-coating the set of substrates in the solution, and heating the set of substrates;

thereafter the outer electrocatalytic coating being applied to the substrate one at a time.

22. An electrode for use in electrolytic processes comprising a substrate of film-forming metal having a porous electrocatalytic coating comprising at least one of a platinum-group metal and a platinum-group metal oxide in an amount of at least about 2 g/m² over the projected surface area of the substrate, and the substrate having below the coating a preformed barrier layer consisting essentially of a surface oxide film grown up from the substrate, and at least one of rhodium and iridium oxides, together with a further metal incorporated in the surface oxide film during formation thereof in an amount of not more than about 1 g/m² on a metal weight basis per projected surface area of the substrate.

23. The electrode of claim 22 wherein the surface oxide film comprises not more than 1 g/m² iridium and ruthenium in a weight ratio of about 2 to 1.

24. An electrode for use in electrolytic processes comprising a titanium substrate having a porous electrocatalytic coating comprising at least one of a platinum-group metal and a platinum-group metal oxide in an amount of at least about 2 g/m² over the projected surface area of the substrate, and the substrate having below the coating a preformed barrier layer consisting essentially of a rutile titanium dioxide film grown up from the substrate, and at least one of rhodium and iridium together with a further metal incorporated in the surface oxide film during formation thereof in an amount of not more than about 1 g/m² on a metal weight basis per projected surface area of the substrate.

25. The electrode of claim 24 wherein the surface oxide film comprises not more than 0.5 g/m² of iridium and ruthenium in a weight ratio of about 2 to 1.

33. A method for manufacture of an electrode for use in an electrolytic process comprising the steps of:

(1) selecting an electrode having a film-forming metal substrate surface;

(2) selecting a relatively dilute coating solution comprising at least one thermodecomposable compound of at least one of rhodium and iridium metals, the coating solution being of a type at least mildly chemically aggressive to the film forming metal and forming a barrier layer grown up from the substrate;

(3) applying the coating solution to the electrode;

(4) drying the applied coating solution and heating the electrode and the applied coating solution to at least partially thermally decompose the solution metals and to at least partially oxidize the film-forming metal at the surface of the substrate, thereby incorporating a substantial portion of the solution metals into the substrate surface constituting an electrode barrier coating;

(5) repeating steps (3) and (4) until a desired quantity of the barrier solution metals have been incorporated into the substrate surface;

(6) selecting an electrocatalytic coating compound comprising at least one of a platinum-group metal and a platinum-group metal oxide of the type forming a electrocatalytic coating;

(7) making at least one application of the electrocatalytic coating compound to the electrode, thereby establishing an outer electrocatalytic coating on the electrode; and

(8) controlling the application of the electrocatalytic coating compound whereby platinum-group metal and platinum-group metal oxide accumulating over the projected surface area of the substrate is greater than about 2 g/m².

34. The method of claim 33 wherein the dilute solution is mildly acidic.

35. The method of claim 33 wherein the electrocatalytic coating compound comprises a solution of a thermodecomposable platinum-group metal compound and including the additional steps of:

(1) applying at least one coating of the electrocatalytic coating solution to the electrode and heating the electrode to thermally decompose the thermodecomposable platinum-group metal compound; and

(2) limiting each said coating layer to not more than 0.2 g/m² of platinum-group metal per projected area of the substrate base.

36. The method of claim 33 including the step of applying the electrocatalytic coating compound by plasma spraying.

37. The method of claim 33 including the additional step of applying by plasma spraying at least one coating of an oxide of a film-forming metal over the barrier coating prior to application of the electrocatalytic coating compound, and including the step of applying the electrocatalytic coating compound by plasma spraying.

38. The method of claim 33 including the step of heating the electrode following an application of the barrier coating solution to a temperature between about 300°

and about 600°

C. for a period of from about 5 minutes to about 15 minutes.

39. The method of claim 35 including the step of heating the electrode following an application of barrier coating solution to a temperature between about 300°

C. and about 600°

C. for a period of from about 5 minutes to about 15 minutes.

40. An electrode produced by the method of any of claims 33, 34, 35, 36, 37, 38, and 39.