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Pattern position detecting system

  • US 4,334,241 A
  • Filed: 04/14/1980
  • Issued: 06/08/1982
  • Est. Priority Date: 04/16/1979
  • Status: Expired due to Term
First Claim
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1. A pattern position detecting system comprising imaging means to pick up an image of an object which includes a target pattern to-be-detected, first means connected with said imaging means and to successively cut out local patterns of an image surface on the basis of image signals delivered from said imaging means, second means to successively generate positional coordinates which indicate typical positions of the respective local patterns cut out, third means to compare the respective local patterns with a standard pattern having the same feature as that of the target pattern and to obtain degrees of coincidence, fourth means connected with said second and third means and to compare the degree of coincidence with the degrees of coincidence of the other local patterns in the vicinity of the particular local pattern so as to successively sample the local patterns whose degrees of coincidence become the maximum, said fourth means storing the positional coordinates and degrees of coincidence of the respective local patterns whose degrees of coincidence become the maximum, and fifth means connected with said fourth means and to sample positional coordinates fulfilling a positional relationship inherent to the target pattern from among the positional coordinates finally left in said fourth means, the sampled positional coordinates being identified as indicating a position of said target pattern.

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