Pattern position detecting system
First Claim
1. A pattern position detecting system comprising imaging means to pick up an image of an object which includes a target pattern to-be-detected, first means connected with said imaging means and to successively cut out local patterns of an image surface on the basis of image signals delivered from said imaging means, second means to successively generate positional coordinates which indicate typical positions of the respective local patterns cut out, third means to compare the respective local patterns with a standard pattern having the same feature as that of the target pattern and to obtain degrees of coincidence, fourth means connected with said second and third means and to compare the degree of coincidence with the degrees of coincidence of the other local patterns in the vicinity of the particular local pattern so as to successively sample the local patterns whose degrees of coincidence become the maximum, said fourth means storing the positional coordinates and degrees of coincidence of the respective local patterns whose degrees of coincidence become the maximum, and fifth means connected with said fourth means and to sample positional coordinates fulfilling a positional relationship inherent to the target pattern from among the positional coordinates finally left in said fourth means, the sampled positional coordinates being identified as indicating a position of said target pattern.
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Abstract
A pattern position detecting system includes an image pickup device to pick up the image of an object which includes a target pattern which is to be detected. On the basis of the output of the pickup device, local patterns of the image surface are successively cut out and positional coordinates of the local patterns are successively generated to indicate the typical positions of each of these local patterns. The respective local patterns are then compared with a standard pattern having the same feature as that of the target pattern and the degree of coincidence therebetween is detected. The different degrees of coincidence of the local patterns in the vicinity of a particular local pattern are then compared so as to successively sample the local pattern whose degrees of coincidence become a maximum, and the positional coordinates and degrees of coincidence of the respective local patterns whose degrees of coincidence become a maximum are then stored. The positional coordinates fulfilling the positional relationship inherent to the target pattern from among the positional coordinates finally selected are then sampled and the sampled positional coordinates are identified as indicating a position of the target pattern.
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Citations
7 Claims
- 1. A pattern position detecting system comprising imaging means to pick up an image of an object which includes a target pattern to-be-detected, first means connected with said imaging means and to successively cut out local patterns of an image surface on the basis of image signals delivered from said imaging means, second means to successively generate positional coordinates which indicate typical positions of the respective local patterns cut out, third means to compare the respective local patterns with a standard pattern having the same feature as that of the target pattern and to obtain degrees of coincidence, fourth means connected with said second and third means and to compare the degree of coincidence with the degrees of coincidence of the other local patterns in the vicinity of the particular local pattern so as to successively sample the local patterns whose degrees of coincidence become the maximum, said fourth means storing the positional coordinates and degrees of coincidence of the respective local patterns whose degrees of coincidence become the maximum, and fifth means connected with said fourth means and to sample positional coordinates fulfilling a positional relationship inherent to the target pattern from among the positional coordinates finally left in said fourth means, the sampled positional coordinates being identified as indicating a position of said target pattern.
Specification