Process for making solid-state color imaging device

• US 4,339,514 A
• Filed: 11/03/1980
• Issued: 07/13/1982
• Est. Priority Date: 11/03/1980
• Status: Expired due to Term

• Current Assignee: Polaroid Corporation (PLR IP Holdings LLC)
• Original Assignee: Polaroid Corporation (PLR IP Holdings LLC)
• Inventors: Biber, Conrad H.
• Primary Examiner(s): Downey, Mary F.
• Application Number:
  US06/202,945
• Time in Patent Office: 617 Days
• Field of Search: 430/7, 430/312, 430/319, 430/320, 430/321, 313/371, 313/367
• US Class Current: 430/7
• CPC Class Codes: G03F 7/0007 Filters, e.g. additive colour filters; Components for display devices
• CPC Class Codes: G03F 7/04 Chromates G03F7/075 takes precedence
• CPC Class Codes: H01L 31/02162 for filtering or shielding light, e.g. multicolour filters for photodetectors

Abstract

Processes for making an electronic color imaging device, the color imaging device comprising a planar array of charge-handling semiconductive photosensors and a multicolor filter means, the multicolor filter means comprising a planar array of color filter elements superimposed in micro-registration over the sensing area of said photosensors. In general, the processes comprise the steps of: (1) successively coating on a planar array of semiconductive photosensors a plurality of photoresponsive layers; (2) subjecting each photoresponsive layer in succession to radiation whereby to provide an exposed area of said layer; (3) removing unexposed photoresponsive coating from each layer in succession; and, (4) dyeing exposed areas of each layer said coating in succession to obtain a series of chromatic filter elements. The processes are capable of producing color filter elements having dimensions of approximately 6 by 6 micrometers.

Claims

1. In a process for making a color imaging device, said color imaging device comprising an array of charge-handling semiconductive photosensors with an array of color filter elements superimposed in micro-registration with the sensing area of said photosensors, the process comprising the steps of:

(1) successively coating on an array of semiconductive photosensors a plurality of photoresponsive layers;

(2) subjecting each photoresponsive layer in succession to active radiation whereby to provide an exposed area of that particular layer;

(3) removing unexposed photoresponsive coating of each layer in succession; and

(4) dyeing exposed areas of each layer of said coating in succession to obtain a series of chromatic filter elements.

2. In a process for making a color imaging device, said color imaging device comprising an array of charge-handling semiconductive photosensors with an array of color filter elements superimposed in micro-registration with the sensing area of said photosensors, the process comprising the steps of:

(1) applying a first coating of photoresponsive material on said array of semiconductive photosensors, said photoresponsive material being adapted to be hardened as a result of photoexposure to radiation incident on said material;

(2) exposing said first photoresponsive coating to active radiation incident in a pattern representing a first set of filter elements to provide selectively exposed areas of said first coating;

(3) removing unexposed photoresponsive coating;

(4) dyeing the remaining areas of said first coating with a first color to obtain a first series of chromatic filter elements;

(5) applying a second coating of photoresponsive material on said array of semiconductive photosensors;

(6) exposing said second photoresponsive coating to active radiation incident in a pattern representing a second set of filter elements to provide selectively exposed areas of said second coating;

(7) removing unexposed photoresponsive coating;

(8) dyeing the remaining areas of said second coating with a second color to obtain a second series of chromatic filter elements;

(9) applying a third coating of photoresponsive material on said array of semiconductive photosensors;

(10) exposing said third photoresponsive coating to active radiation incident in a pattern representing a third set of filter elements to provide selectively exposed areas of said third coating;

(11) removing unexposed photoresponsive coating; and

,

(12) dyeing the remaining areas of said third coating with a third color to obtain a third series of chromatic filter elements.

3. A process as defined in claim 2, including the step of coating a protective polymeric layer on the external surface of said optical filter elements.

4. A process as defined in claim 2, wherein one of said colors comprises red, one of said colors comprises green, and one of said colors comprises blue.

5. A process as defined in claim 2, wherein at least one of said photoresponsive coatings comprises a polymer selected from the group consisting of potassium, sodium and ammonium dichromate sensitized gelatin.

6. A process as defined in claim 2, wherein an adhesive laquer is interposed between each of said photoresponsive coatings and the immediately preceding coating.

7. The process of claim 2 wherein said exposing steps comprise exposing the successive photosensitive coatings through different photomasks representing said first, second and third sets of said filter elements respectively.

8. The process of claim 2 wherein said exposing steps comprise exposing the successive photosensitive coatings at different angles through a lenticular array to respectively provide exposed areas representing said first, second and third sets of filter elements.

9. A color imaging device, an array of charge-handling semiconductive photosensors having an array of color filter elements superimposed in micro-registration with the sensing area of said photosensors, constructed by the steps of:

(1) applying a first coating of photoresponsive material on said array of semiconductive photosensors, said photoresponsive material being adapted to be hardened as a result of selective photoexposure to radiation incident on said material;

(2) exposing said first photoresponsive coating to active radiation in a pattern representing a first set of filter elements to provide selectively exposed areas of said first coating;

(3) removing unexposed photoresponsive coating;

p1 (4) dyeing the remaining areas of said first coating with a first color to obtain a first series of chromatic filter elements;

(5) applying a second coating of photoresponsive material on said array of semiconductive photosensors;

(6) exposing said second photoresponsive coating to active radiation in a pattern representing a second set of filter elements to provide selectively exposed areas of said second coating;

(7) removing unexposed photoresponsive coating;

(8) dyeing the remaining areas of said second coating with a second color to obtain a second series of chromatic filter elements;

(9) applying a third coating of photoresponsive material on said array of semiconductive photosensors;

(10) exposing said third photoresponsive coating to active radiation in a pattern representing a third set of filter elements to provide selectively exposed areas of said third coating;

(11) removing unexposed photoresponsive coating; and

,

(12) dyeing the remaining areas of said third coating with a third color to obtain a third series of chromatic filter elements an adhesive layer between each of said photoresponsive coatings.

10. The product as defined in claim 9, including the step of coating a protective polymeric layer on the external surface of said optical filter elements.