Method of producing a microstructured surface and the article produced thereby

• US 4,340,276 A
• Filed: 10/10/1979
• Issued: 07/20/1982
• Est. Priority Date: 11/01/1978
• Status: Expired due to Term

• Current Assignee: 3M Company
• Original Assignee: 3M Company
• Inventors: Willson, Richard F., Maffitt, Kent N.
• Primary Examiner(s): Gantz, Delbert E.
• Assistant Examiner(s): Leader, William
• Application Number:
  US06/080,530
• Time in Patent Office: 1,014 Days
• Field of Search: 204/192 E, 204/192 EC, 350/276 R, 350/165, 350/164, 156/643, 427/164, 428/148, 428/333, 428/338, 428/339, 428/412, 428/458
• US Class Current: 359/581
• CPC Class Codes: B29D 11/00 Producing optical elements, e.g. lenses or prisms grinding or polishing of optical elements B24B; constructional form of optical elements G02B; optical parts of spectacles G02C7/00
• CPC Class Codes: B29D 11/00865 Applying coatings; tinting; colouring printing, marking or copying processes B41M; identification in general G09F3/00; producing decorative effects in general B44C; positioning or marking of lenses B24B13/0055
• CPC Class Codes: C08J 7/12 Chemical modification
• CPC Class Codes: Y10T 428/24413 Metal or metal compound
• CPC Class Codes: Y10T 428/261 In terms of molecular thickness or light wave length
• CPC Class Codes: Y10T 428/268 Monolayer with structurally defined element
• CPC Class Codes: Y10T 428/269 including synthetic resin or polymer layer or component
• CPC Class Codes: Y10T 428/31507 Of polycarbonate
• CPC Class Codes: Y10T 428/31681 Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]

Abstract

A method is disclosed for producing a micro structure on the surface of an article. The method comprises the steps of depositing a discontinuous coating of a material exhibiting a low rate of sputter etching on a substrate exhibiting a higher rate of sputter etching and differentially sputter etching the composite surface to produce a topography of pyramid-like micropedestals random in height and separation. The articles produced by this method are characterized by both the microstructured surface and by the detectable presence of the material exhibiting the lower rate of sputter etching. The microstructured surface results in the articles having uniform antireflecting properties over a large range of angles of incident light and over an extremely broad range of wavelengths, in which the antireflecting characteristic is obtained without an attendant increase in diffuse scattering. Also, the microstructured surface results in the articles being characterized by a high degree of adherence, such that the treated surface may be considered to be "primed", thereby enabling the application of highly adherent coatings or layers thereon.

Claims

1. A method for forming a microstructured surface having antireflective characteristics comprising

(a) selecting a substantially transparent, polymeric substrate having a predetermined rate of sputter etching under a given set of sputtering conditions;

(b) applying onto said substrate discontinuous microislands of a material selected from the group consisting of metal oxides, refractory metals, and noble metals, having a rate of sputter etching lower than said predetermined rate under said given set of sputtering conditions to form a composite surface on which portions of the underlying substrate are exposed between the discontinuities of said microislands, said material being applied in an average thickness in the range of 0.1 to 10 mm; and

(c) sputter etching said composite surface under said given set of sputtering conditions in a partial atmosphere of a reactive gas to promote the formation of a top layer on said microislands having a desirably low sputtering rate and to preferentially etch the exposed portions of the substrate, while said discontinuous microislands are etched at a lower rate, resulting in a random topography of micropedestals which vary in height within a range of approximately 0.01 to 0.2 μ

m, and are separated from adjacent micropedestals a distance within a range of approximately 0.05 to 0.5 μ

m and which exhibit substantially decreased specular reflectance without an attendant increase in diffuse scattering.

2. A method according to claim 1, comprising applying said discontinuous islands by vapor deposition onto said substrate of a said material having a said lower rate of sputter etching.

3. A method according to claim 1, comprising applying said discontinuous islands by sputtering onto said substrate a said material having a said lower rate of sputter etching.

4. A method according to claim 1 comprising applying microislands of chromium, aluminum or glass.

5. A method according to claim 1, further comprising the step of cleansing said substrate prior to applying said microislands to remove contaminating oils, particulate matter or the like which may provide non-uniform conditions affecting the steps of applying said microislands or said sputter etching.

6. A method according to claim 1, comprising sputter etching said composite surface in a partial atmosphere of oxygen.

7. A method according to claim 1 wherein said step of sputter etching comprises positioning said substrate on the cathode electrode of an RF diode sputtering apparatus, enclosing said electrode within an evacuatable container, evacuating said container to a pressure less than 10^-4 torr, backfilling with oxygen to a pressure in the range of 10^-2 torr, coupling RF between the anode and cathode electrodes of said apparatus to initiate a plasma therebetween, and maintaining said plasma at a predetermined power density level for a given duration of time.

8. A method according to claim 1 wherein said applying step comprises:

(a) providing an RF sputtering apparatus having within an evacuatable container substantially parallel and separate cathode and anode electrodes,

(b) positioning said substrate on said anode electrode,

(c) positioning a source of said lower sputter etching rate material on said cathode electrode, said source having overall dimensions at least as large as said substrate and having a surface profile substantially like that of the exposed surface of said substrate such that all portions thereof are substantially equispaced from said source,

(d) enclosing said electrodes within said container and establishing therein a partial atmosphere of an inert gas at a pressure in the range of 10^-2 -10^-3 torr,

(e) coupling RF between the electrodes to initiate a plasma therebetween and maintaining said plasma at a predetermined power density level for a given duration of time during which said source material is sputter deposited onto said exposed surface to form said microislands.

9. A method according to claim 1, wherein said selecting step comprises forming said substrate on a separate base member.

10. An optical article having a microstructured surface thereon exhibiting antireflective characteristics, said article comprising

a substantially transparent, polymeric substrate characterized by a predetermined rate of sputter etching under a given set of sputtering conditions and having thereon a random topography of discrete micropedestals varying in height within a range of approximately 0.01 and 0.2 μ

m, randomly separated from adjacent micropedestals a distance within a range of approximately 0.05 to 0.5 μ

m, wherein said micropedestals have associated therewith a generally detectable material comprising metal oxides, noble metals, and mixtures and alloys thereof, said material having a rate of sputter etching lower than said predetermined rate under said given set of sputtering conditions, and wherein said topography results in a said microstructured surface which exhibits substantially decreased specular reflectance without an attendant increase in diffuse scattering resulting in enhanced transmissivity.

11. An article comprising a substantially transparent, polymeric substrate characterized by a predetermined rate of sputter etching under a given set of sputtering conditions and having thereon a topography of discrete micropedestals varying in height within a range of approximately 0.01 and 0.2 μ

m, randomly separated from adjacent micropedestals a distance within a range of approximately 0.05 to 0.5 μ

m, said micropedestals having associated therewith a generally detectable material comprising metal oxides, noble metals and mixtures and alloys thereof, said material having a rate of sputter etching lower than said predetermined rate under said given set of sputtering conditions, and a layer bonded to said substrate, wherein the presence of said micropedestals results in enhanced bonding of said layer while also providing an interface between the substrate and layer, having a gradation in the optical index of refraction such that the interface is substantially invisible.

12. An article according to claim 11, comprising a substrate selected from an optical grade polymer or copolymer of polycarbonate having said micropedestals covering at least one surface thereof and having a said layer consisting of an abrasion resistant top-coat selected from the group consisting of epoxy-functional silanes and acryloxy or methacryloxy.