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Deposition of coatings from vaporized reactants

  • US 4,351,861 A
  • Filed: 05/18/1981
  • Issued: 09/28/1982
  • Est. Priority Date: 09/23/1977
  • Status: Expired due to Term
First Claim
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1. In a method for coating a substrate with a film by deposition from a vaporous reactant composition comprising the steps of:

  • fluidizing a mass of particulate solid reactant with a gas at a first temperature substantially below the reaction, vaporization or decomposition temperature of the reactant;

    drawing a volume of fluidizing gas and suspended particulate solid reactant from the fluidized mass as a particulate reactant-gas composition;

    mixing the withdrawn volume of fluidizing gas and suspended particulate reactant with an additional volume of gas which is at a second temperature, also below the decomposition temperature for the reactant to dilute the particulate reactant-gas composition;

    heating the diluted particulate reactant-gas composition to a temperature above the vaporization temperature of the reactant; and

    conveying the heated reactant-gas composition into contact with the substrate to be coated;

    the improvement which comprises maintaining the substrate at a temperature below said reaction temperature but sufficient to cause the reactant in the composition to deposit a film thereon.

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