Low shock transmissive antechamber seal mechanisms for vacuum chamber type semi-conductor wafer electron beam writing apparatus

• US 4,355,937 A
• Filed: 12/24/1980
• Issued: 10/26/1982
• Est. Priority Date: 12/24/1980
• Status: Expired due to Fees

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Mack, Alfred, O'Neill, Brian C., Penzetta, Fred L.
• Primary Examiner(s): Sheridan, Robert G.
• Application Number:
  US06/219,657
• Time in Patent Office: 671 Days
• Field of Search: 414/217, 34/242
• US Class Current: 414/217
• CPC Class Codes: H01J 37/18 Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel vacuum locks for electron-beam tubes in general H01J29/865
• CPC Class Codes: Y10S 414/139 including wafer charging or discharging means for vacuum chamber

Abstract

An electron beam vacuum chamber is provided with an elevator mechanism within the chamber including a platform closing off an opening within a horizontal vacuum chamber wall and separating the vacuum chamber from an overlying antechamber partially defined by a vertically displaceable lid overlying the opening and moving towards and away from the opening. Resilient peripheral seals are fixed to the lid facing the chamber wall and the elevator platform. A coil spring partially compressible upon contact with the first peripheral seal carried by the lid with the face of the vacuum chamber wall forms a first mechanical override and an annular spring metal diaphragm fixedly mounted about its outer peripheral edge to the vacuum chamber adjacent the opening has its inner peripheral edge freely flexible and is contacted by the resilient peripheral seal of the platform to form a second mechanical override.

Claims

1. In an electron beam writing system for beam writing on work pieces, said system including:

an electron beam vacuum chamber having internally a beam writing area,

an access opening within said vacuum chamber to one side of the beam writing area,

movable means mounted to said vacuum chamber for movement between a first position in sealing contact with said vacuum chamber about said access opening to define an antechamber with said opening and for closing and sealing said antechamber to said vacuum chamber and to the atmosphere and for movement away from said chamber to a second position remote therefrom to permit access to the interior of said antechamber and said electron beam vacuum chamber, and

drive means for shifting said movable means between said first and said second positions,

the improvement comprising

mechanical override means interposed between said drive means and said movable means for dampening impact during sealing contact between said movable means and said vacuum chamber and means for preventing vibration transfer, at the termination of movement of said movable means at said first and said second positions, to said vacuum chamber beam writing area to facilitate simultaneous beam writing on work at said beam writing area and loading and unloading of another workpiece through said access opening.

2. The electron beam writing system as claimed in claim 1, wherein said override means comprise reilient mechanical override means for dampening shock during closing and sealing of said antechamber.

3. The electron beam writing system as claimed in claim 2, wherein said vacuum chamber includes a horizontal wall, said access opening is formed within said horizontal wall, said movable means comprises a vertically displaceable lid overlying said access opening and bearing a first compressible resilient peripheral seal on the periphery thereof for sealing contact with the top of the vacuum chamber wall, about the periphery of said opening, said drive means comprises an air cylinder fixed to said chamber, said override means operatively coupling said air cylinder to said lid and comprising spring means interposed between said lid and said air cylinder;

whereby, flexure of said spring means upon initial contact of said first compressible resilient seal with said vacuum chamber wall dampens shock during sealing closure of said lid against said vacuum chamber wall.

4. The electron beam writing system as claimed in claim 3, wherein said spring means comprises a coil spring and wherein said air cylinder means is fixedly located above said vacuum chamber wall, and said lid and said coil spring are dimensioned such that the compression of said coil spring when said air cylinder means fully displaces said lid in the direction of said vacuum chamber wall provides the sole sealing force acting on said first peripheral seal to effect a seal between said lid and said vacuum chamber horizontal wall.

5. The electron beam writing system as claimed in claim 4, further comprising means for adjusting the compression on said coil spring during closure of said lid to vary the sealing force effected through said first peripheral seal against said vacuum chamber horizontal wall.

6. The electron beam writing system as claimed in claim 5, wherein said air cylinder means comprises a vertically displaceable piston rod overlying and coaxial with said opening within said vacuum chamber horizontal wall, said lid comprises an inverted cup-shaped member, and wherein said override means comprises a cylindrical casing fixedly, coaxially mounted to said lid on the upper face thereof, said cylindrical casing including a bore and being counterbored at the bottom thereof, a flanged cylinder axially adjustably fixed at one end to said piston rod and being slidably mounted within said cylindrical casing and having a radially enlarged flange at the end remote from said piston rod positioned within said counterbore, said coil spring being interposed between the lower flanged end of said cylinder and the face of said lid and biasing the lower flanged end of said cylinder away from the top of said lid, such that upon initial contact of the compressible resilient peripheral with the top of said vacuum chamber horizontal wall, further compression of said coil spring acts to permit limited overtravel of said air cylinder rod relative to said cylindrical casing and said lid to dampen shock and reduce vibration transmitted to said vacuum chamber.

7. The electron beam writing system as claimed in claim 1, wherein said moveable means for closing and sealing said access opening and defining said antechamber further comprises an elevator mechanism within said chamber to one side of the beam writing area, said elevator mechanism including a work piece bearing elevator platform, an elevator drive shaft assembly fixed to said platform and mounted to said vacuum chamber for vertically displacing said elevator platform within said chamber, and wherein said driving means comprising actuating means coupled to said shaft assembly for vertically raising and lowering said elevator drive shaft assembly and said platform carried thereby between a first raised position and a second lowered position, said elevator platform including a second compressible resilient peripheral seal movable towards the bottom of the vacuum chamber wall about the periphery of the access opening therein, and wherein said mechanical override means comprises a flexible, resilient contact member mounted to the bottom of said chamber wall in the path of said second compressible peripheral seal carried by said platform to permit override of said platform during raising of the platform to seal off the access opening to said vacuum chamber interior and to partially define said antechamber.

8. The electron beam writing system as claimed in claim 7, wherein said resilient contact member comprises an annular spring metal diaphragm and means for fixedly mounting said diaphragm about its outer periphery to said vacuum chamber wall with its inner periphery spaced from said wall so as to flex freely to a limited degree in the direction of said access opening upon contact therewith by said compressible resilient seal carried by said elevator platform.

9. An electron beam writing system for beam writing on a work piece, said system including:

an electron beam vacuum chamber having a beam writing area internally thereof,

an elevator mechanism within said chamber to one side of said beam writing area,

said mechanism including a work piece bearing elevator platform,

an elevator drive shaft assembly fixed to said platform and mounted to said chamber for vertically displacing said elevator platform within said chamber,

said vacuum chamber including a horizontal vacuum chamber wall overlying said elevator platform,

an opening within said vacuum chamber horizontal wall axially aligned with said elevator platform,

a vertically displaceable lid overlying said opening and mounted to said vacuum chamber for movement towards and away from said opening,

a first compressible resilient peripheral seal fixed to said lid, facing said chamber wall for contact with said vacuum chamber wall on the upper surface thereof, about the periphery of said opening,

a second compressible resilient peripheral seal carried by said elevator platform, facing the lower surface of said vacuum chamber horizontal wall for contact therewith about the periphery of said opening,

first actuating means coupled to said shaft assembly for vertically raising and lowering said platform carried thereby between a first raised position, and a second lowered position,

second acutating means operatively coupled to said lid for vertically raising and lowering said lid to cause said lid to sealingly engage said vacuum chamber wall via said first seal,

said lid, said platform and said opening within said vacuum chamber wall defining an antechamber to said vacuum chamber and permitting loading and unloading of work pieces to and from said electron beam vacuum chamber,

load force counterbalancing means connected to said elevator drive shaft assembly to automatically balance various load forces acting on the elevator mechanism during operation to place said elevator mechanism in a condition substantially zero mass, thereby permitting rapid movement of said elevator platform by said elevator actuating means, with minimal force and minimum vibration and shock to said system;

whereby, a first work piece may be moved by said elevator mechanism, while simultaneously electron beam writing is effected on a second work piece within said vacuum chamber beam writing area to increase work piece throughput,

cushioned stops positoned in the path of said elevator mechanism for permitting vertical displacement of said elevator platform within said chamber and positioning said platform at said first and said second positions,

first mechanical override means interposed between said second actuating means and said lid,

said first mechanical override means comprising a compressible coil spring,

said coil spring being at least partially compressible upon contact with the first peripheral seal carried by said lid with the the face of said vacuum chamber horizontal wall, and

said second actuating means being operatively coupled to said lid through said first mechanical override means, such that the sealing force exerted on said first peripheral seal is effected solely through said compressible coil spring,

second mechanical override means interposed between said vacuum chamber wall and said second dperipheral seal carried by said platform, said second mechanical override means comprising an annular, spring metal diaphragm fixedly mounted about its outer peripheral edge to said vacuum chamber adjacent said opening and having the other peripheral edge freely flexible in the direction of movement of said platform and being positioned in the path of movement of said platform carried peripheral seal;

whereby, minimal vibration and shock is transmitted to said system during opening and closing of said antechamber.