Device fabrication procedure
First Claim
1. A process for fabricating a device including the step of sputtering a borosilicate glass target material on at least part of a surface to form a borosilicate glass layer, characterized in that the borosilicate glass target material used in the sputtering procedure is prepared by a procedure comprising the steps of:
- a. mixing together a substance A consisting essentially of SiO2 with a substance B consisting essentially of B2 O3 ; and
b. heat treating the resulting mixture at a temperature between 1500 and 2100 degrees C. for at least six hours.
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Accused Products
Abstract
A fabrication technique is described for making various devices in which a type of glass is used as a surface protection layer. The glass layers are put down by particle bombardment (generally sputtering) of a borosilicate glass target. Devices with such surface layers are also described. Such glass layers are highly advantageous as encapsulating material, diffusion barrier layers, etc., particularly for optical type devices and certain semiconductor devices. Particularly important is the preparation procedure for the glass target used in the bombardment process. The glass layers are moisture stable, act as excellent barriers against diffusion, and are usable up to quite high temperatures without cracking or peeling. The glass layers also provide long-term protection against atmosphere components including water vapor, oxygen, atmosphere pollution contaminants, etc.
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Citations
36 Claims
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1. A process for fabricating a device including the step of sputtering a borosilicate glass target material on at least part of a surface to form a borosilicate glass layer, characterized in that the borosilicate glass target material used in the sputtering procedure is prepared by a procedure comprising the steps of:
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a. mixing together a substance A consisting essentially of SiO2 with a substance B consisting essentially of B2 O3 ; and b. heat treating the resulting mixture at a temperature between 1500 and 2100 degrees C. for at least six hours. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A device comprising a surface at least partially coated with a borosilicate glass layer, said layer fabricated by sputtering a borosilicate glass target material characterized in that the borosilicate glass target material used in the sputtering procedure is prepared by a procedure comprising the steps of
a. mixing together a substance A consisting essentially of SiO2 in which at least 90 weight percent of the SiO2 has a particle size less than 10 microns with a substance B consisting essentially of B2 O3 in which at least 90 weight percent of the B2 O3 has a particle size less than 10 microns and b. heat treating the resulting mixture at a temperature between 1500 and 2100 degrees C. for at least 6 hours.
Specification