Graded index waveguide structure and process for forming same

• US 4,375,312 A
• Filed: 08/07/1980
• Issued: 03/01/1983
• Est. Priority Date: 08/07/1980
• Status: Expired due to Term

• Current Assignee: Hughes Electronics Corporation (AT&T, Inc.)
• Original Assignee: Hughes Aircraft Company (Rtx Corporation)
• Inventors: Tangonan, Gregory L.
• Primary Examiner(s): Lee, John D.
• Application Number:
  US06/175,998
• Time in Patent Office: 936 Days
• Field of Search: 350/96.11, 350/96.12, 350/96.30, 350/96.31, 65/3.11, 65/3.14, 427/163, 430/321, 430/323, 430/329
• US Class Current: 385/132
• CPC Class Codes: G02B 6/1342 using diffusion diffusion in single crystals C30B31/00; diffusion in glass C03C23/00

Abstract

The specification discloses a process for forming a graded index waveguide structure by first providing a substrate of a first selected optical material having a chosen index of refraction. Next, a patterned layer of a second optical material is formed on one surface of the substrate or, optionally, within selected cavities formed in the substrate. This second optical material has a refractive index which is larger than the refractive index of the substrate. The patterned layer of the second optical material is formed in a predetermined geometry and to a predetermined thickness. Then, a layer of a third selected optical material is formed on the patterned layer of the second optical material and on the substrate surface to a predetermined thickness. This third optical material has a refractive index which is substantially the same as the refractive index of the substrate. Finally, the substrate with the patterned layer of the second optical material and the layer of the third optical material deposited thereon is heated to an elevated temperature for a period of time sufficient to diffuse the second optical material into the first and third optical materials and to form a graded index waveguide structure.

Claims

1. Process for forming a graded index waveguide structure comprising the steps of:

(a) providing a substrate of a first selected optical material having a chosen index of refraction;

(b) forming a patterned layer of a second selected optical material on one surface of said substrate, said second selected optical material having an index of refraction which is larger than said index of refraction of said first selected optical material of said substrate, and said pattern being formed in a predetermined geometry and to a predetermined thickness;

(c) forming a layer of a third selected optical material on said patterned layer of said second selected optical material and on said surface of said substrate, to a predetermined thickness, said third optical material having an index of refraction substantially the same as said index of refraction of said first optical material; and

(d) heating said substrate with said patterned layer of said second optical material and said layer of said third optical material deposited thereon to an elevated temperature for a period of time sufficient to diffuse said second optical material into said substrate and into said layer of said third optical material and to thereby form said graded index waveguide structure.

2. The process set forth in claim 1 wherein step "b" comprises:

(a) depositing a layer of said second optical material on one surface of said substrate;

(b) depositing a layer of a selected photoresist material on said layer of said second optical material;

(c) exposing said layer of said photoresist to selected radiation through a mask defining said predetermined geometry;

(d) developing said layer of said photoresist after said exposing, to leave behind a patterned portion of said layer of said photoresist which has said predetermined geometry;

(e) removing the portion of said layer of said second optical material exposed by openings in said patterned portion of said layer of said photoresist; and

(f) removing said patterned portion of said layer of said photoresist to leave behind said patterned layer of said second optical material.

3. The process set forth in claim 1 wherein:

(a) said substrate is selected from the group consisting of fused quartz and a transparent glass having a softening temperature of 1000°

C. or higher;

(b) said second optical material is selected from the group consisting of germanium oxide (GeO₂) and lead oxide (PbO₂) and is deposited to a thickness in the range of 5 to 10 micrometers; and

(c) said heating is performed at a temperature in the range of 1350°

to 1450°

C. for a period of approximately 5 hours.

4. The process set forth in claim 1 wherein:

(a) said substrate is fused quartz having a refractive index of 1.47;

(b) said second optical material is germanium oxide (GeO₂) having a refractive index of 1.7 and said pattern is formed in the shape of a "Y" and to a thickness in the range of 5 to 10 micrometers;

(c) said layer of said third selected optical material is silicon dioxide (SiO₂) and is formed by a chemical vapor deposition process and deposited to a thickness of approximately 100 micrometers; and

(d) said heating is performed at a temperature of approximately 1400°

C. for a period of approximately 5 hours.

5. Process for forming a graded index waveguide structure comprising the steps of:

(a) providing a substrate of fused quartz having a refractive index of about 1.47;

(b) forming a patterned layer of germanium oxide (GeO₂) having a refractive index of about 1.7 on one surface of said substrate, said pattern being formed in a predetermined geometry and to a thickness in the range of 5 to 10 micrometers;

(c) forming a layer of silicon dioxide (SiO₂) on said patterned layer of said GeO₂ and on said surface of said substrate to a thickness of approximately 100 micrometers, said SiO₂ having a refractive index of about 1.47; and

(d) heating said substrate with said patterned layer of said GeO₂ and said layer of said SiO₂ deposited thereon to a temperature of approximately 1400°

C. for a period of 5 hours to diffuse said GeO₂ into said substrate and into said layer of said SiO₂ and to thereby form said graded index waveguide structure.

6. A graded index waveguide structure formed by:

(a) providing a substrate of a first selected optical material having a chosen index of refraction;

(b) forming a patterned layer of a second selected optical material on one surface of said substrate, said second selected optical material having an index of refraction which is larger than said index of refraction of said first selected optical material of said substrate, and said pattern being formed in a predetermined geometry and to a predetermined thickness;

(c) forming a layer of a third selected optical material on said patterned layer of said second optical material and on said surface of said substrate to a predetermined thickness, said third optical material having an index of refraction substantially the same as said index of refraction of said first optical material; and

(d) heating said substrate with said patterned layer of said second optical material and said layer of said third optical material deposited thereon to an elevated temperature for a period of time sufficient to diffuse said second optical material into said first and third optical materials and to thereby form said graded index waveguide structure.

7. The waveguide structure set forth in claim 6 wherein step "b" comprises:

(a) depositing a layer of said second optical material on one surface of said substrate;

(b) depositing a layer of a selected photoresist material on said layer of said second optical material;

(c) exposing said layer of said photoresist to selected radiation through a mask defining said predetermined geometry;

(d) developing said layer of said photoresist after said exposing, to leave behind a patterned portion of said layer of said photoresist which has said predetermined geometry;

(e) removing the portion of said layer of said second optical material exposed by openings in said patterned portion of said layer of said photoresist; and

(f) removing said patterned portion of said layer of said photoresist to leave behind said patterned layer of said second optical material.

8. The waveguide structure set forth in claim 6 wherein:

(a) said substrate is selected from the group consisting of fused quartz and a transparent glass having a softening temperature of 1000°

C. or higher;

(b) said second optical material is selected from the group consisting of germanium oxide (GeO₂) and lead oxide (PbO₂) and is deposited to a thickness in the range of 5 to 10 micrometers; and

(c) said heating is performed at a temperature in the range of 1350°

to 1450°

C. for a period of approximately 5 hours.

9. A graded index waveguide structure formed by:

(a) providing a substrate of fused quartz having a refractive index of about 1.47;

(b) forming a patterned layer of germanium oxide (GeO₂) having a refractive index of about 1.7 on one surface of said substrate, said pattern being formed in a predetermined geometry and to a thickness in the range of 5 to 10 micrometers;

(c) forming a layer of silicon dioxide (SiO₂) on said patterned layer of said GeO₂ and on said surface of said substrate to a thickness of approximately 100 micrometers, said SiO₂ having a refractive index of about 1.47; and

(d) heating said substrate with said patterned layer of said GeO₂ and said layer of said SiO₂ deposited thereon to a temperature of approximately 1400°

C. for a period of approximately 5 hours to diffuse said GeO₂ into said substrate and into said layer of said SiO₂ and to thereby form said graded index waveguide structure.

10. A process for simultaneously forming a plurality of graded index waveguide structures comprising the steps of:

(a) providing a substrate of a first selected optical material having a chosen index of refraction;

(b) forming a pattern of cavities in one surface of said substrate, said cavities having a predetermined geometry;

(c) depositing a second selected optical material into said cavities in said substrate to a predetermined thickness, said second selected optical material having an index of refraction which is larger than said index of refraction of said first selected optical material;

(d) forming a layer of a third selected optical material on said second selected optical material and on said surface of said substrate to a predetermined thickness, said third optical material having an index of refraction substantially the same as said index of refraction of said substrate; and

(e) heating said substrate with said second selected optical material deposited therein and said layer of said third selected optical material formed thereon to an elevated temperature for a period of time sufficient to diffuse said second selected optical material into said substrate and into said layer of said third selected optical material and to thereby form said plurality of said graded index waveguide structures.

11. A plurality of graded index waveguide structures formed in a selected substrate by the process set forth in claim 10.