Method of repairing surface defects in coated laser mirrors

• US 4,388,344 A
• Filed: 08/31/1981
• Issued: 06/14/1983
• Est. Priority Date: 08/31/1981
• Status: Expired due to Fees

• Current Assignee: United Technologies Corporation (Raytheon Technologies Corporation d/b/a RTX)
• Original Assignee: United Technologies Corporation (Raytheon Technologies Corporation d/b/a RTX)
• Inventors: Shuskus, Alexander J., Cowher, Melvyn E.
• Primary Examiner(s): Smith, John D.
• Application Number:
  US06/297,899
• Time in Patent Office: 652 Days
• Field of Search: 427/39, 427/140, 427/142, 427/162, 427/166, 427/167, 350/310
• US Class Current: 427/576
• CPC Class Codes: C03C 17/3482 comprising silicon, hydrogenated silicon or a silicide
• CPC Class Codes: C23C 16/402 Silicon dioxide
• CPC Class Codes: C23C 16/507 using external electrodes, e.g. in tunnel type reactors
• CPC Class Codes: G02B 1/10 Optical coatings produced by application to, or surface treatment of, optical elements G02B1/08 takes precedence
• CPC Class Codes: G02B 5/08 Mirrors vehicle mirrors involving special optical features B60R1/08
• CPC Class Codes: H01S 3/08059 Constructional details of the reflector, e.g. shape mirrors in general G02B5/08; mountings for mirrors G02B7/18

Abstract

A method of repairing an intermediate amorphous silicon and/or germanium bond coat on a laser mirror substrate is described. The initial coating is put down by polishing the mirror substrate followed by depositing a layer of amorphous silicon, amorphous germanium, or mixtures thereof on the mirror surface, and polishing the thus coated mirror surface to a substantially void-free surface finish. A layer of oxide of silicon or germanium is deposited on the thus formed coating either during, after, or in sandwich fashion during the formation of such intermediate bond coat. The intermediate coating can be surface polished back to the original amorphous layer or the oxide can remain on the surface after polishing.

Claims

1. The method of repairing surface defects in an amorphous silicon or amorphous germanium deposited coating on a laser mirror substrate comprising forming an oxide layer of the silicon or germanium on the deposited coating by plasma enhanced chemical vapor deposition.

2. The method of claim 1 wherein the oxide coating is formed by introducing a source of reactive oxygen into the process during the vapor deposition of the amorphous silicon or amorphous germanium coating.

3. The method of claim 1 wherein the oxide surface is formed by plasma oxidation of the already deposited amorphous coating in the chemical vapor deposition chamber.

4. The method of claim 1 wherein the formed oxide coating is removed except in the defect areas by polishing back to the amorphous silicon or germanium coating.

5. The method of claim 2 wherein amorphous silicon or amorphous germanium deposition is continued after the oxide layer is formed.

6. The method of claim 1 wherein after polishing, the surface has a surface finish of about 10 to about 15 A rms.

7. The method of claim 1 wherein the amorphous silicon or amorphous germanium is at least 15 microns thick.

8. The method of claim 1 including depositing a laser radiation reflecting outer layer on the repaired surface.

9. The method of claim 1 wherein the mirror substrate comprises graphite fiber reinforced glass, silicon carbide or molybdenum.

10. The method of claim 1 wherein the deposited coating is amorphous silicon.