Method of forming metallic patterns on curved surfaces

• US 4,388,388 A
• Filed: 06/04/1981
• Issued: 06/14/1983
• Est. Priority Date: 06/04/1981
• Status: Expired due to Term

• Current Assignee: GDE Systems, Inc. (The O'Gara Group, Inc.)
• Original Assignee: General Dynamics Corporation
• Inventors: Kornbau, Thomas W., Sievers, Robert A.
• Primary Examiner(s): Downey, Mary F.
• Application Number:
  US06/270,338
• Time in Patent Office: 740 Days
• Field of Search: 343/909, 343/705, 343/708, 343/873, 430/313, 430/5, 430/314, 430/295, 430/319, 430/320, 430/323, 430/258
• US Class Current: 430/258
• CPC Class Codes: G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L21/00, H05K
• CPC Class Codes: H05K 1/0284 Details of three-dimensional rigid printed circuit boards H05K1/119 takes precedence; shaping of the substrate H05K3/0014
• CPC Class Codes: H05K 2201/09018 Rigid curved substrate
• CPC Class Codes: H05K 2203/056 Using an artwork, i.e. a photomask for exposing photosensitive layers
• CPC Class Codes: H05K 3/0002 for manufacturing artworks for printed circuits
• CPC Class Codes: H05K 3/0082 characterised by the exposure method of radiation-sensitive masks

Abstract

A method of forming metallic patterns on a dielectric surface such as a radome surface that has a compound curve which includes the steps of coating the radome with a metal and then with a photoresist. An electrical pattern is formed on the photographic emulsion of a thin membrane that is used as a photo mask. A water soluble adhesive, which is non degradable to the exposure and development of the photoresist and the etching of the conductive surface is applied to the metallic surface and the photo mask is pressed into position on the adhesive to conform to the curvature of the radome. The photo mask is removed and the electrical pattern is provided on the surface by conventional developing and etching techniques to provide a clear, well defined pattern even in arrays wherein the pattern segments are of small dimension.

Claims

1. The method of providing an electrical pattern on an element with a curved surface of dielectric material comprising the steps of;

coating said surface with a metal;

coating said metal with a photoresist;

forming a pattern in the emulsion of a stripping film that includes an emulsion on a thin membrane of flexible material having a thickness on the order of about one-half thousandth inch;

applying a thin layer of water soluble adhesive on said photoresist, said adhesive being non degradable to a subsequent process of exposing and developing the photoresist and etching away portions of said metal;

pressing said membrane against said adhesive in close engagement with the surface to conform said membrane to said curved surface;

exposing said membrane to a source of ultraviolet light to fix the pattern on said photoresist;

removing said membrane from said curved surface; and

developing said photoresist and etching away that portion of the conductive surface that has not been fixed with said photoresist;

said method providing a sharp, clearly defined pattern in said curved surface.

2. The method according to claim 1 wherein said curved surface includes a compound curvature.

3. The method according to claim 1 wherein the adhesive is a gel.

4. The method according to claims 1 or 2 wherein the element is a radome for airborne vehicles.

5. The method according to claim 1 wherein the membrane includes a backing strip and the backing strip is removed after the pattern is fixed in the emulsion on said membrane.

6. The method according to claim 4 wherein the pattern is a slot pattern for radiating energy from a radar antenna and receiving tracking signals.

7. The method according to claim 1 wherein a mask is formed that comprises a plurality of said membranes, each membrane being of a size to accommodate the curvature of the surface to which it is applied without destructive wrinkling.