Plasma device comprising an intermediate electrode out of contact with a high frequency electrode to induce electrostatic attraction

• US 4,399,016 A
• Filed: 03/11/1982
• Issued: 08/16/1983
• Est. Priority Date: 03/12/1981
• Status: Expired due to Term

• Current Assignee: Anelva Corporation (Canon Inc.)
• Original Assignee: Anelva Corporation (Canon Inc.)
• Inventors: Tsukada, Tsutomu, Takei, Hideo
• Primary Examiner(s): Demers, Arthur P.
• Application Number:
  US06/357,216
• Time in Patent Office: 523 Days
• Field of Search: 156/345, 156/643, 204/192 E, 204/298, 204/164, 118/723
• US Class Current: 156/345.45
• CPC Class Codes: C23C 14/50 Substrate holders
• CPC Class Codes: H01J 37/32431 Constructional details of the reactor

Abstract

In a support member for supporting a sample processed in a hollow space between first and second electrodes between which a high frequency a.c. voltage is supplied to produce plasma in the hollow space, a conductor is laid on the first electrode with a first dielectric layer interposed therebetween and is covered with a second dielectric layer to be attached to the sample. A d.c. voltage source is connected through the first dielectric layer out of contact with the first electrode to induce electrostatic attraction during production of the plasma and, thereby, to fixedly attach the sample to the second dielectric layer. A temperature control member is embedded in the first electrode to control a temperature of the sample. The control member may be a cooling member or a heater. A plurality of the support members may be located on the first electrode. Preferably, the first and the second dielectric layers are of epoxy resin and polyimide resin, respectively.

Claims

1. In a plasma device for processing a sample by the use of plasma, comprising a chamber defining a hollow space therein, a first flat electrode member placed in said hollow space and having a first electrode surface, a second flat electrode member placed in said hollow space and having a second electrode surface directed towards said first electrode surface, support means having a first support surface to be brought into contact with said first electrode surface and a second support surface directed towards said second electrode surface for supporting said sample on said second support surface, a.c. voltage providing means for providing an a.c. voltage between said first and said second electrode members to produce said plasma between said first electrode member with said support means and said second electrode member, d.c. voltage producing means for producing a d.c. voltage to electrostatically couple said sample to said support means during production of said plasma and thereby to fixedly attach said sample to said second support surface, the improvement wherein:

said second means comprises;

a first dielectric layer defining said first support surface;

a conductor placed on said first dielectric layer out of contact with said first electrode surface and electrically connected to said d.c. voltage producing means, with said first electrode member electrically insulated fron said d.c. voltage producing means; and

a second dielectric layer covered on said conductor and defining said second support surface to which said sample is to be attached.

2. A plasma device as claimed in claim 1, further comprising insulating means laid internally of said first electrode member and extended to said conductor through said first dielectric layer for electrically insulating said d.c. voltage producing means from said first electrode member to connect said d.c. voltage producing means to said conductor out of contact with said first electrode member.

3. A plasma device as claimed in claim 2, wherein said second support surface is substantially equal in size to said sample.

4. A plasma device as claimed in claim 3, further comprising temperature control means buried in said first electrode member for controlling a temperature of said first electrode member.

5. A plasma device as claimed in claim 4, said temperature control means being for cooling said first electrode member by the use of a predetermined coolant, wherein said temperature control means comprises a conduit extended in said first electrode member for allowing said coolant to flow therethrough.

6. A plasma device as claimed in claim 4, wherein said temperature control means comprises a heater for heating said first electrode member.

7. A plasma device as claimed in any one of claims 1 through 6, further comprising at least one of additional supporting means on said first electrode surface, said additional supporting means comprising structural elements corresponding to those of said supporting means recited in claim 1.

8. A plasma device as claimed in any one of claims 1 through 6 wherein said first dielectric layer is of epoxy resin including a ceramic filler.

9. A plasma device as claimed in any one of claims 1 through 6, wherein said second dielectric layer comprises a film of a pressure sensitive adhesive which provides said second support surface.

10. A plasma device as claimed in any one of claims 1 through 6, wherein said second dielectric layer comprises a coated film of a high molecular material selected from a group consisting of polyimide resin, silicone rubber, and epoxy resin.

11. A plasma device as claimed in claim 10, wherein said coated film includes a filler in addition to said high polymer material.

12. A plasma device as claimed in any one of claims 1 through 6, wherein said conductor is of a metal, each of said first and said second dielectric layers being of an oxide of said metal.

13. A plasma device as claimed in any one of claims 1 through 6, wherein each of said first and said second dielectric layers is of a material selected from a group consisting of ceramic, glass, and plastic.

14. A plasma device as claimed in any one of claims 1 through 6, wherein each of said first and said second dielectric layers is of a sprayed metal oxide.