Workpiece holder

• US 4,403,567 A
• Filed: 08/21/1980
• Issued: 09/13/1983
• Est. Priority Date: 08/21/1980
• Status: Expired due to Term

• Current Assignee: Commonwealth Scientific & Industrial Research Organisation (Commonwealth Of Australia As Represented By Department Of Industry, Innovation, Climate Change, Science, Research And Tertiary Education)
• Original Assignee: Commonwealth Scientific & Industrial Research Organisation (Commonwealth Of Australia As Represented By Department Of Industry, Innovation, Climate Change, Science, Research And Tertiary Education)
• Inventors: Hughes, William E., daCosta, Harry, Howerton, Hugh K., Monk, Gaines W.
• Primary Examiner(s): Smith, John D.
• Assistant Examiner(s): Plantz, Bernard F.
• Application Number:
  US06/179,960
• Time in Patent Office: 1,118 Days
• Field of Search: 118/724, 118/500, 118/730, 118/729, 118/732, 118/319, 118/59, 118/69, 118/900, 118/50, 269/21, 252/70, 165/104 R, 165/104 S, 165/80 R, 165/80 D, 165/80 E, 165/185, 165/104 M, 165/104.15, 165/104.19, 165/104.21, 165/104.17, 165/104.33 , 165/104.11, 204/298
• US Class Current: 118/500
• CPC Class Codes: H01L 21/6838 with gripping and holding devices using a vacuum; Bernoulli devices

Abstract

A workpiece holder for semiconductor workpieces during treatment with a substantially cylindrical casing shaped like a hockey puck having an upper surface for receiving a workpiece, a lower surface, at least one bore between the surfaces for applying a vacuum and a hollow interior for a heat absorbing composition preferably one which melts above ambient temperature but below temperatures which might damage workpieces. Suitable compositions include Glauber'"'"'s salt, and calcium chloride hexahydrate. In one embodiment, curved, substantially radially extending vanes are preferably provided in the interior space for causing radial flow when the casing is rotated or oscillated. In a second embodiment, a plurality of bores extend between a manifold which extends radially and a plurality of circumferential grooves.

Claims

1. A workpiece holder for semiconductor workpieces during treatment comprising:

a casing having an upper exterior surface for receiving and holding a workpiece thereon, an opposed lower surface and a hollow interior having a fixed space; and

a heat absorbing composition chosen from the group consisting of Glauber'"'"'s salt and calcium chloride hexahydrate sealed within said interior for absorbing heat from said workpiece during treatment.

3. A holder as in claim 1, wherein said casing includes a bore communicating with said upper surface for removing air therefrom, to adhere said workpiece to said upper surface.

7. A holder as in claim 1, wherein said casing has a groove extending about the peripheral surface between said upper and lower surfaces.

8. A holder as in claim 1, wherein said casing is made of copper.

11. A holder as in claim 1 or 10 wherein said casing is substantially cylindrical.

2. A workpiece holder for semiconductor workpieces during treatment comprising:

a casing having an upper exterior surface for receiving and holding a workpiece thereon, an opposed lower surface, and a hollow interior;

a heat absorbing composition sealed within said interior for absorbing heat from said workpiece during treatment; and

a plurality of curved, substantially radially extending vanes in said interior space for causing radial flow of said composition when said casing is rotated or oscillated.

4. A workpiece holder for semiconductor workpieces during treatment comprising:

a casing having an upper exterior surface for receiving and holding a workpiece thereon, an opposed lower surface, a hollow interior, a bore extending axially between said surfaces for removing air from said upper surface to adhere said workpiece to said upper surface, a plurality of circular grooves on said upper surface and a plurality of grooves on said upper surface extending radially outward from said bore; and

a heat absorbing composition sealed within said interior for absorbing heat from said workpiece during treatment.

5. A workpiece holder for semiconductor workpieces during treatment comprising:

a casing having an upper exterior surface for receiving and holding a workpiece thereon, an opposed lower surface, a hollow interior, a bore communicating with said upper surface for removing air therefrom to adhere said workpiece to said upper surface, a plurality of circular grooves on said upper surface, a plurality of bores extending in an axial direction toward said lower surface from said grooves and a radially extending manifold connected to said bores and adapted to be connected to a vacuum source at the peripheral surface of said casing for removing air from said upper surface to adhere said workpiece to said upper surface; and

a heat absorbing composition sealed within said interior for absorbing heat from said workpiece during treatment.

6. A workpiece holder for semiconductor workpieces during treatment comprising:

a casing formed of a threaded base and threaded top which are screwed together and having an upper exterior surface for receiving and holding a workpiece thereon, an opposed lower surface, and a hollow interior; and

a heat absorbing composition sealed within said interior for absorbing heat from said workpiece during treatment.

9. A workpiece holder for semiconductor workpieces during treatment comprising:

a casing having an upper exterior surface for receiving and holding a workpiece thereon, an opposed lower surface, a hollow interior and a bore communicating with said upper surface for removing air therefrom to adhere said workpiece to said upper surface, a metal filled elastomer disc on said upper surface for receiving said workpiece and having perforations extending therethrough and in communication with said bore; and

a heat absorbing composition sealed within said interior for absorbing heat from said workpiece during treatment.

10. A workpiece holder for semiconductor workpieces during treatment comprising:

a casing having an upper exterior surface for receiving and holding a workpiece thereon, an opposed lower surface and a hollow interior having a fixed space;

a heat absorbing composition chosen from the group consisting of Glauber'"'"'s salt and calcium chloride hexahydrate sealed within said interior for absorbing heat from said workpiece during treatment; and

a flexure disc mounted in a recess in the peripheral surface between the upper and lower surfaces for engaging a workpiece clamp to attach said clamp to said holder.

12. A workpiece holder for a semiconductor workpiece during treatment, which treatment heats said workpiece comprising:

a closed case having a hollow interior with a fixed space and an upper exterior surface for receiving a workpiece to be treated; and

a composition sealed in said case which changes between solid and liquid states in the range of 20°

-30°

C. for absorbing heat from said workpiece during treatment.