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Method of fabricating display with semiconductor circuits on monolithic structure and flat panel display produced thereby

  • US 4,409,724 A
  • Filed: 11/03/1980
  • Issued: 10/18/1983
  • Est. Priority Date: 11/03/1980
  • Status: Expired due to Term
First Claim
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1. A process of fabricating a semiconductor structure comprising:

  • forming a plurality of islands of polycrystalline semiconductor material disposed in spaced relation to each other on a substrate;

    subjecting said polycrystalline semiconductor islands to focused energy from a source thereof wherein the focused energy is at an intensity sufficient to cause recrystallization of the polycrystalline semiconductor material of said islands;

    converting the polycrystalline semiconductor material in said islands to crystalline semiconductor material having an enhanced electron mobility characteristic in response to the focused energy impinging thereon causing recrystallization thereof;

    removing any regions untreated by focused energy and focused energy-induced distorted regions from each of said islands of crystalline semiconductor material; and

    fabricating electronic devices in respective crystalline semiconductor islands.

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