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Preparation of photosensitive block copolymer elements

  • US 4,423,135 A
  • Filed: 08/16/1982
  • Issued: 12/27/1983
  • Est. Priority Date: 01/28/1981
  • Status: Expired due to Term
First Claim
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1. A process for forming a solvent-soluble, photosensitive elastomeric element comprising applying to a sheet support a layer of a photosensitive, elastomeric composition to a dry thickness of from about 0.005 to about 0.25 inch, said composition comprising(1) at least 30% by weight of at least one solvent-soluble, thermoplastic, elastomeric block copolymer containing at least two thermoplastic, nonelastomeric polymer blocks having a glass transition temperature above 25°

  • C. and an average molecular weight of 2000-100,000, and between said thermoplastic, nonelastomeric polymer blocks an elastomeric polymer block having a glass transition temperature below 10°

    C. and an average molecular weight of about 25,000 to 1,000,000,(2) at least 1% by weight of an addition-polymerizable ethylenically unsaturated compound containing at least one terminal ethylenical group, and(3) a polymerization-effective amount of polymerization initiator activatable by actinic radiation;

    laminating onto said layer a combination of (a) a strippable flexible cover sheet having coated thereon (b) a solvent-soluble, flexible, polymeric film, so that the surface of said film is contiguous to the surface of said layer.

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