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Visual defect inspection of masks

  • US 4,432,641 A
  • Filed: 10/16/1981
  • Issued: 02/21/1984
  • Est. Priority Date: 10/16/1981
  • Status: Expired due to Fees
First Claim
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1. A method for visually inspecting specimens of photoresist coated masks having a sensitivity to radiation in the blue and ultra-violet wave length spectrum, comprising:

  • (a) generating an elongated light source of sodium light said source of light being substantially free of radiation in the blue and ultra-violet wave length spectrum;

    (b) focusing said source in a Kohler-type illumination system within the exit pupil thereof;

    (b1) said Kohler-type illumination system having at least three lens elements, comprising two contiguous input lens elements and spaced therefrom one output lens element, wherein an aerial surface of uniform illuminance is located between said three lens elements and the source, an entrance pupil plane is located at the input side of the output lens element, and an image surface plane is located at the output side of said output lens element;

    (c) imaging said light source as an aerial image within the exit pupil of said lens system at an aerial surface that is a conjugate of said light source; and

    (d) projecting a substantially uniform illuminance field on a specimen positioned at a plane that is conjugate to said aerial surface of uniform illuminance with sufficiently high contrast levels and illuminance levels to detect with the human eye defects as small as 2 μ

    m by scattering light from said defects.

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