Ion beam coating apparatus

• US 4,440,108 A
• Filed: 09/24/1982
• Issued: 04/03/1984
• Est. Priority Date: 09/24/1982
• Status: Expired due to Fees

• Current Assignee: Spire Corporation
• Original Assignee: Spire Corporation
• Inventors: Little, Roger G., Shanfield, Stanley R.
• Primary Examiner(s): LAWRENCE, EVAN
• Application Number:
  US06/423,454
• Time in Patent Office: 557 Days
• Field of Search: 118/719, 118/723, 118/50.1, 427/38, 427/41, 427/39, 204/192 N, 204/298, 250/492.3
• US Class Current: 118/719
• CPC Class Codes: C04B 35/5831 based on cubic boron nitrides or Wurtzitic boron nitrides, including crystal structure transformation of powder
• CPC Class Codes: C23C 16/342 Boron nitride
• CPC Class Codes: C23C 16/509 using internal electrodes
• CPC Class Codes: H01J 37/08 Ion sources; Ion guns
• CPC Class Codes: H01J 37/32431 Constructional details of the reactor

Abstract

A coating apparatus and method for coating industrial cutting and turning tools of any desired shape and configuration and the like significantly to improve the tools'"'"' working properties. The coating is formed of cubic boron nitride, with a preferred thickness not exceeding ten microns. The coating apparatus includes an rf excited plasma source chamber having a gas feed ring for ionizing a gas admitted into the chamber via the ring. The preferred feed gas is a borazine and benzene vapor mixture. A coating chamber is mounted adjacent to and contiguous with the plasma source chamber via a neck portion. The coating chamber includes a vacuum interlock to permit the entry and removal of a tool transport. At least one vacuum pump is operatively connected to the chamber. Preferably, a plurality of permanent magnets and electron supply filaments are arranged circumferentially about the plasma source chamber. Preferably, the tool transport is rotatable during coating. Preferably, the apparatus is microprocessor controlled.

Claims

1. Apparatus for coating parts by means of a plasma supported ion beam comprising:

(a) a plasma source chamber provided with an anode and having rf means for exiting a plasma therein, a gas feed ring at one end and a neck portion at the other end thereof;

(b) a coating chamber mounted adjacent and contiguous with said plasma source chamber via said neck portion;

(c) a plurality of permanent magnets and a plurality of electron supply filaments both arranged circumferentially about said source chamber, with adjacent magnets of said plurality of permanent magnets having opposed polarity, the relative positions of said anode, said electron supply filaments and said magnets being such that the permanent magnets will be capable of increasing the path lengths of electrons between said filaments and said anode;

(d) vacuum pump means operatively connected to both said chambers; and

(e) a vacuum interlock provided in said coating chamber so as to admit said parts to be coated into said coating chamber.

2. The apparatus of claim 1 wherein said plasma source chamber is provided with means to cool said chamber externally.

3. The apparatus of claim 1 wherein said neck portion includes at least one extraction grid and a neutralizer filament stretched thereacross.

4. The apparatus of claim 1 wherein said coating chamber includes an insulated ground screen to allow for the even coating of said parts therein.

5. The apparatus of claim 1 wherein said coating chamber is provided with a work transport admissible into said chamber via said vacuum interlock.

6. The apparatus of claim 5 wherein said coating chamber is further provided with means to heat and to rotate said work transport within said chamber.

7. The apparatus of claim 1 wherein the diameter of said neck portion is from about 20 cm to about 50 cm.

8. The apparatus of claim 1 wherein said coating to be applied to said parts is cubic boron nitride and which apparatus is microprocessor controlled.

9. The apparatus of claim 1 wherein said plasma supported ion beam has a variable beam energy from about 200 to about 2000 electron volts, a beam current density from about 0.5 to about five milliamperes per square centimeter, and wherein said apparatus further includes means to heat said parts to a temperature from ambient up to about 1000°

C. and means to provide a bias voltage to said parts from about -1 to about -1000 VDC.

10. The apparatus of claim 1 wherein said vacuum pump means is a turbo-molecular pump.

11. The apparatus of claim 1 wherein said rf means for exciting said plasma within said chamber includes an rf antenna formed of a spiral copper tubing.

12. The apparatus of claim 1 wherein said coating chamber is provided with an observation window through which the coating of said parts may be observed.

13. The apparatus of claim 1 further provided with a feedback system to stabilize an ion beam generated in said rf excited plasma source chamber by affecting the power of the rf signal therein.

14. The apparatus of claim 3 wherein said one extraction grid is a fine-apertured stainless steel plate and said neutralizer filament is heated.