Method of forming laser diffraction grating for beam sampling device

• US 4,440,839 A
• Filed: 02/22/1983
• Issued: 04/03/1984
• Est. Priority Date: 03/18/1981
• Status: Expired due to Fees

• Current Assignee: United Technologies Corporation (Raytheon Technologies Corporation d/b/a RTX)
• Original Assignee: United Technologies Corporation (Raytheon Technologies Corporation d/b/a RTX)
• Inventors: Mottier, Francois M.
• Primary Examiner(s): Bowers, Jr., Charles L.
• Application Number:
  US06/468,614
• Time in Patent Office: 406 Days
• Field of Search: 430/1, 430/2, 430/321, 430/5, 430/323, 350/3.69, 350/3.7, 350/3.72, 350/3.73, 350/169, 350/162.16, 350/162.17, 350/162.2, 350/162.23
• US Class Current: 430/2
• CPC Class Codes: G02B 5/32 Holograms used as optical elements
• CPC Class Codes: Y10S 359/90 Methods

Abstract

A combined holographic grating that samples a high energy laser beam and focuses the sample into a spot is formed by the cross-modulation term of a linear holographic grating and a holographic zone plate.

Claims

1. A method of forming a cross product diffraction grating on a surface of a laser mirror for deflecting a sampled beam of predetermined wavelength from a beam incident on said mirror surface and focusing said sampled beam, comprising the steps of:

generating a zone plate interference pattern for a Gabor-type holographic zone plate, said zone plate pattern having predetermined parameters for focusing deflected radiation at a predetermined position;

generating a linear interference pattern for a first holographic diffraction grating for deflecting a sample beam of optical radiation towards said predetermined position;

forming a cross product interference holographic pattern in a light-sensitive medium by exposing said light-sensitive medium to said interference patterns; and

transferring said cross product holographic interference pattern to said mirror surface, thereby forming said cross product diffraction grating on said mirror surface.

2. A method according to claim 1, in which said zone plate interference pattern is embodied in a zone plate mask and said zone plate mask is contact printed onto said light-sensitive medium under illumination adjusted to generate said interference pattern for said first holographic diffraction pattern.

3. A method according to claim 2, in which said zone plate mask is generated by exposing a light-sensitive medium to an interference pattern of coherent radiation having a first wavelength formed by combining radiation from a plane wave traveling along a predetermined axis with radiation from a point source located at a point source position along said predetermined axis, said first wavelength being different from said predetermined wavelength, and by scaling said first zone plate by the ratio of said predetermined wavelength and said first wavelength to form said zone plate mask.

4. A method according to claim 2, in which said zone plate interference pattern is generated by forming a pattern of light and dark areas representative of the intensity distribution of an analytic zone plate having a predetermined relationship to said predetermined parameters and transferring said zone plate interference pattern to a light-sensitive mask.

5. A method according to claim 4, in which said pattern of light and dark areas are generated with a predetermined scale factor with respect to said cross product diffraction grating and said cross product pattern is transferred with a reduction in scale of the inverse of said predetermined scale factor to said mask medium.

6. A method according to claim 2, further comprising the additional steps of:

forming an inverse mask of said zone plate mask and contact printing said inverse mask onto said light-sensitive medium under illumination adjusted to form a second holographic diffraction grating, corresponding to said holographic diffraction grating, with inverted phase, whereby a combined cross product diffraction grating pattern carrying the cross product of said zone plate and both of said diffraction gratings is formed in said light sensitive medium.

7. A method according to claim 1 in which said light sensitive medium is a photoresistive material disposed on said mirror surface and said step of transferring comprises ion milling said mirror surface through said photoresistive material.

8. A method according to claim 1 in which said step of transferring said cross product pattern further comprises the step of processing said light sensitive medium to form a final holographic mask carrying said cross product holographic diffraction pattern and transferring said pattern from said mask to said mirror surface.