Pattern detecting apparatus

• US 4,441,206 A
• Filed: 12/14/1981
• Issued: 04/03/1984
• Est. Priority Date: 12/17/1980
• Status: Expired due to Term

• Current Assignee: Hitachi, Ltd.
• Original Assignee: Hitachi, Ltd.
• Inventors: Hosaka, Sumio, Terasawa, Tsuneo, Kuniyoshi, Shinji, Kawamura, Yoshio, Kurosaki, Toshiei, Takanashi, Akihiro
• Primary Examiner(s): Martin, John C.
• Assistant Examiner(s): McDowell, Erin A.
• Application Number:
  US06/330,778
• Time in Patent Office: 841 Days
• Field of Search: 382/8, 382/45, 382/48, 356/400, 356/373, 356/375, 356/401, 364/489, 364/490, 364/491, 364/559, 250/561, 358/107, 358/101
• US Class Current: 382/287
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
• CPC Class Codes: H01L 21/30 Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 manufacture of electrodes thereon H01L21/28

Abstract

A pattern detecting apparatus is disclosed which comprises, in order to detect the center of a positioning pattern on a sample with high accuracy in a wide range, means for illuminating the positioning pattern, means for defining an illumination range in which the positioning pattern is illuminated, means for focusing reflected light from the positioning pattern on a predetermined image plane, means for electrically detecting a bright and dark image on the image plane in accordance with positions on the image plane, means for removing a signal corresponding to the outside of the illumination range from the output signal of the detecting means and for holding, in place of the removed signal, a level of the output signal produced within the illumination range, and means for detecting a position of the center of the positioning pattern from the output signal of the holding means.

Claims

1. A pattern detecting apparatus comprising:

means for illuminating a positioning pattern formed on a sample with illumination light;

means for defining a range illuminated with said illumination light, said positioning pattern being illuminated in said range;

means for optically focusing reflected light from said positioning pattern on a predetermined image plane;

means for electrically detecting a bright and dark image on said image plane in accordance with positions on said image plane;

means for removing a signal corresponding to a region outside said illumination range from a detection signal and for holding, in place of said removed signal, a level of said detection signal produced within said illumination range of said illumination light, said detection signal being obtained by said detecting means; and

means for detecting a position of the center of said positioning pattern from an output signal of the holding means.

2. A pattern detecting apparatus according to claim 1, wherein said defining means is an aperture provided in a shading plate.

3. A pattern detecting apparatus according to claim 1, wherein said detecting means includes a slit for scanning said image plane and a photodetector for converting the intensity of light having passed through said slit into an electric signal in accordance with the position of said slit.