Achromatic holographic element

• US 4,447,111 A
• Filed: 02/25/1982
• Issued: 05/08/1984
• Est. Priority Date: 02/25/1982
• Status: Expired due to Term

• Current Assignee: Grumman Aerospace Corporation (Northrop Grumman Corporation)
• Original Assignee: Grumman Aerospace Corporation (Northrop Grumman Corporation)
• Inventors: Leib, Kenneth G.
• Primary Examiner(s): ARNOLD, BRUCE
• Application Number:
  US06/352,362
• Time in Patent Office: 803 Days
• Field of Search: 350/3.7, 350/3.77, 350/3.72, 350/3.73, 350/320
• US Class Current: 359/15
• CPC Class Codes: G02B 5/32 Holograms used as optical elements
• CPC Class Codes: Y10S 359/90 Methods

Abstract

A process for producing a holographic optical element which operates at a multiplicity of wavelengths and which has no chromatic aberration is disclosed. The achromatic holographic elements are fabricated using substantially conventional apparatus employing a technique based on the phenomenon that any two playback wavelengths will be diffracted to the same angle if their construction angles are related to each other as the inverse of the ratio of their sines. In addition, in the case of holographic lenses, if the focal points during construction are related to each other as the inverse of the ratio of the sines of their construction angles, the diffracted wavelengths will be brought to a common focal point.

Claims

1. The method for fabricating an achromatic holographic optical element for diffracting radiation of wavelengths λ

₁ . . . λ

_n comprising the steps of;

making a first exposure in a three-dimensional photosensitive recording medium of the intersection of a first pair of mutually coherent electromagnetic beams having a wavelength of λ

₁, said beams comprising a signal and a reference beam, said beams being incident on said recording medium with said signal beam being incident normal to said medium surface and said reference beam having an angle of incidence θ

₁ to said surface normal, said exposure forming a first diffraction means havng periodic structures in said medium;

making further exposures in said recording medium of the intersection of further pairs of mutually coherent electromagnetic beams having a wavelength λ

₁, each of said beam pairs comprising a signal and a reference beam, said reference beams of said pairs being incident at an angle, θ

₂ through θ

_n respectively on said recording medium, said exposures forming further overlapping diffraction means having periodic structures in said medium with the angles θ

₁ . . . θ

_n being related to one another as the inverse of the ratio of their sines, whereby said optical element diffracts radiation of wavelengths λ

₁ . . . λ

_n through a common angle such that the general relationship (λ

_i /λ

_j)=(Sin θ

_j /Sin θ

_i) obtains.

2. The method defined in claim 1 wherein the signal beam during the making of the first exposure in the recording medium is a diverging beam which has a focal length F₁ and wherein said signal beam during the making of the further exposures in said recording medium has a focal length F₂ . . . F_n respectively, said focal lengths being related to one another as the inverse of the ratio of the sines of the angles θ

₁ . . . θ

_n, whereby the optical element diffracts radiation of wavelengths λ

₁ . . . λ

_n to a common focal point such that the general relationship (F_i /F_j)=(Sin θ

_j /Sin θ

_i) obtains.

3. The method defined in claim 2 wherein the optical element being fabricated is a diffraction grating.

4. The method defined in claim 2 wherein the optical element being fabricated is a lens.

5. The method defined in claims 1 or 2 wherein the recording medium is about 20-100 microns in thickness.

6. The method defined in claim 1 wherein the periodic structures of the diffraction means formed by the exposures are in the surface of the recording medium whereby the optical element diffracts radiation of wavelengths λ

₁ . . . λ

_n through a common angle.

7. The method defined in claim 2 wherein the periodic structures of the diffraction means formed by the exposures are zone plates in the surface of the recording medium whereby the optical element diffracts radiation of wavelengths λ

₁ . . . λ

_n to a common focal point.

8. The method defined in claims 6 or 7 wherein the recording medium is less than 20 microns in thickness.

9. The method for fabricating an achromatic holographic optical element for diffracting radiation of wavelengths λ

₁ . . . λ

_n comprising the steps of;

making a first exposure in a three-dimensional photosensitive thick recording medium of the intersection of two pairs of mutually coherent electromagnetic beams having a wavelength of λ

₁, each of said pairs of said beams comprising a signal and a reference beam, said signal beams being incident normal to said medium surface and said reference beams of said pairs being incident on said thick medium from either side of the medium normal at an angle of incidence θ

₁ to said surface normal, said exposure forming a first zone plate having periodic structures in said medium

making further exposures in said recording medium of the intersection of further pairs of mutually coherent electromagnetic beams having a wavelength λ

₁ , each of said pairs comprising a signal and a reference beam, said reference beams of said pairs being incident on said thick medium from either side of the medium normal at angles of incidence of θ

₂ . . . θ

_n respectively, said exposures forming further overlapping zone plates having periodic structures in said medium with the angles θ

₁ . . . θ

_n being related to one another as the inverse of the ratio of their sines, whereby said thick medium optical element diffracts radiation of wavelengths λ

₁ . . . λ

_n as two output beams each having a common focal point such that the general relationship (F_i /F_j)=(Sin θ

_j /Sin θ

_i) obtains.

10. The method defined in claim 9 wherein the recording medium is about 20-100 microns in thickness.