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Waveform generating apparatus

  • US 4,447,747 A
  • Filed: 03/02/1981
  • Issued: 05/08/1984
  • Est. Priority Date: 03/02/1981
  • Status: Expired due to Fees
First Claim
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1. Monolithic integrated circuit structure comprisinga body of semiconductor material having a region of one conductivity type;

  • a linear resistance of semiconductor material of the opposite conductivity type inset in said region of the one conductivity type;

    said linear resistance being a series of contiguous resistance elements of approximately the same physical configuration and of approximately equal resistance value;

    each resistance element including a projection of semiconductor material of the opposite conductivity type protruding into said region of the one conductivity type;

    a plurality of sectors of semiconductor material of the opposite conductivity type inset in said region of the one conductivity type, the number of sectors being less than the number of resistance elements, said sectors being adjacent to but spaced from the projections of particular ones of said resistance elements; and

    each sector and the projection adjacent thereto forming the drain and source regions, and the portion of the region of the one conductivity type therebetween forming the channel region of an MOS transistor;

    whereinthe particular ones of said resistance elements are spaced from each other by sets of intervening resistance elements; and

    the resistances of the sets of intervening resistance elements have a non-linear relationship, each of the intervening resistance elements of at least one of the sets being at least about 3 percent larger in resistance than each of the intervening resistance elements of at least another of the sets.

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