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Method for producing a semiconductor layer solar cell

  • US 4,449,286 A
  • Filed: 10/27/1981
  • Issued: 05/22/1984
  • Est. Priority Date: 10/17/1979
  • Status: Expired due to Fees
First Claim
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1. In a method for producing a semiconductor layer solar cell by applying a semiconductor layer to a substrate by plasma spraying, in which a semiconductor material is brought out of the plasma zone of the plasma spraying means, the improvement comprising maintaining the energy density in the plasma zone sufficiently high such that the semiconductor vaporizes and is brought out of the plasma zone in the form of a vapor jet, and condensing the vapor jet on the substrate in the form of a semiconductor layer.

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