Substrate with chemically modified surface and method of manufacture thereof

• US 4,452,679 A
• Filed: 08/25/1983
• Issued: 06/05/1984
• Est. Priority Date: 10/07/1981
• Status: Expired due to Term

• Current Assignee: Becton, Dickinson & Co
• Original Assignee: Becton, Dickinson & Co
• Inventors: Williams, Joel L., Montgomery, David B., Dunn, Terry S.
• Primary Examiner(s): Tung, T.
• Assistant Examiner(s): Thane, Nathan S.
• Application Number:
  US06/526,297
• Time in Patent Office: 285 Days
• Field of Search: 204/164, 204/165, 204/168, 204/169, 204/170, 204/173, 204/174, 204/177, 427/39, 427/38, 427/40, 425/174.8
• US Class Current: 204/164
• CPC Class Codes: C03C 23/006 by plasma or corona discharge
• CPC Class Codes: C04B 41/4505 characterised by the method of application
• CPC Class Codes: C04B 41/81 Coating or impregnation
• CPC Class Codes: C08J 7/123 Treatment by wave energy or particle radiation C08J7/18 takes precedence
• CPC Class Codes: C23C 8/36 using ionised gases, e.g. ionitriding
• CPC Class Codes: C30B 33/00 After-treatment of single crystals or homogeneous polycrystalline material with defined structure C30B31/00 takes precedence

Abstract

A method for providing specific chemical functional groups on a substrate surface is provided. In the method a vaporized material is introduced into a reaction zone to produce a plasma. Selective species of the plasma are prevented from contacting the substrate surface while the remaining species are contacted with the substrate.

Claims

1. A method for providing specific chemical functional groups on the surfaces of organic substrates comprising;

(a) providing an organic substrate within a reaction zone

(b) introducing a vaporized material into said reaction zone, said material being suitable for providing a plasma

(c) subjecting said material to plasma producing conditions, whereby the plasma comprises neutral material, positive ions of said material, negative ions of said material, electrons and photons

(d) preventing at least one of the components of said plasma from contacting the surface of said organic substrate,

(e) contacting the surface of said substrate with the remainder of said components of said plasma, and

(f) forming specific functional groups of said material on the surface of said organic substrate.

2. A method in accordance with claim 1 wherein said plasma is produced under electrical discharge conditions.

3. A method in accordance with claim 1 wherein said vaporized material is selected from the group consisting of oxygen, nitrogen, halogen, sulfur, compounds thereof and mixtures thereof.

4. A method in accordance with claim 3 wherein said vaporized material is oxygen and compounds thereof.

5. A method in accordance with claim 3 wherein said vaporized material is nitrogen and compounds thereof.

6. A method in accordance with claim 3 wherein said vaporized material is halogen and compounds thereof.

7. A method in accordance with claim 3 wherein said vaporized material is sulfur and compounds thereof.

8. A method for providing specific chemical functional groups on the surfaces of inorganic substrates comprising

(a) providing an inorganic substrate within a reaction zone

(b) introducing a vaporized material into said reaction zone, said material being suitable for providing a plasma

(c) subjecting said material to a plasma producing condition, whereby the plasma comprises neutral material, positive ions of said material, negative ions of said material, electrons and photons

(d) preventing at least one of the components of said plasma from contacting the surface of said inorganic substrate,

(e) contacting the surface of said substrate with the remainder of said components of said plasma, and

(f) forming specific functional groups of said material on the surface of said inorganic substrate.

9. A method in accordance with claim 8 wherein said plasma is produced under electrical discharge conditions.

10. A method in accordance with claim 8 wherein said vaporized material is selected from the group consisting of oxygen, nitrogen halogen, sulfur, compounds thereof and mixtures thereof.

11. A method in accordance with claim 10 wherein said vaporized material is oxygen and compounds thereof.

12. A method in accordance with claim 10 wherein said vaporized material is nitrogen and compounds thereof.

13. A method in accordance with claim 10 wherein said vaporized material is halogen and compounds thereof.

14. A method in accordance with claim 10 wherein said vaporized material is sulfur and compounds thereof.