Method and apparatus for demounting wafers
First Claim
1. A method of demounting a wafer from an adherent surface, comprising:
- applying, via a passageway through the adherent surface, to and between the adherent surface and a mounting surface of the wafer, a fluid with sufficient pressure to dislodge the wafer; and
removing the dislodged wafer from the adherent surface.
2 Assignments
0 Petitions
Accused Products
Abstract
Wafers (12), including those in the solid state electronics industry, are demounted from an adherent surface (79). A respective passageway (90) is extended from a fluid supply device (92), through the adherent surface (79) to and in communication with, the mounting surface (16) of a respective wafer (12). The fluid is applied via the passageway (90) to and between the mounting surface (16) of the wafer (12) and the adherent surface (79) with sufficient pressure to dislodge the wafer (12). In an advantageous embodiment, the passageway (90) extends to a location between about the centerline (98) and the periphery of the wafer (12). The fluid is thereby applied in an off-center manner with leveraged force to break the seal between the adherent surface (79) and the wafer (12).
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Citations
15 Claims
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1. A method of demounting a wafer from an adherent surface, comprising:
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applying, via a passageway through the adherent surface, to and between the adherent surface and a mounting surface of the wafer, a fluid with sufficient pressure to dislodge the wafer; and removing the dislodged wafer from the adherent surface.
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2. A method of demounting a wafer from an adherent surface, comprising:
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extending a passageway from fluid supply means, through the adherent surface to and in communication with, a mounting surface of the wafer; and applying fluid via a passsageway through the adherent surface to and between the mounting surface of the wafer and the adherent surface with sufficient pressure to dislodge the wafer from the adherent surface. - View Dependent Claims (3, 4, 5, 6, 7, 8)
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9. Apparatus for demounting a wafer from an adherent surface comprising:
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a passageway extending from fluid supply means, through the adherent surface to and in communication with a mounting surface of the wafer; and means for applying the fluid via the passageway to and between the mounting surface of the wafer and the adherent surface with sufficient pressure to dislodge the wafer from the adherent surface. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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Specification