Ion induced thin surface coating

• US 4,474,827 A
• Filed: 07/08/1982
• Issued: 10/02/1984
• Est. Priority Date: 07/08/1982
• Status: Expired due to Term

• Current Assignee: Ferralli, Michael W.
• Original Assignee: Ferralli, Michael W.
• Inventors: Ferralli, Michael W.
• Primary Examiner(s): Lawrence, Evan K.
• Application Number:
  US06/396,430
• Time in Patent Office: 817 Days
• Field of Search: 427/35, 427/38, 427/39-41
• US Class Current: 427/493
• CPC Class Codes: B05D 1/60 Deposition of organic layers from vapour phase vapour phase deposition in general C23C14/00, C23C16/00
• CPC Class Codes: C03C 17/28 with organic material C03C17/34, C03C17/44 take precedence
• CPC Class Codes: C23C 14/48 Ion implantation

Abstract

Thin film coatings comprising hydrocarbon polymers are deposited on and merged into a substrate by causing secondary ionically activated and electric field energized atomic or molecular ionic species including hydrocarbon species to be directed to a substrate in conjunction with an ion beam of primary energetic ions.

Claims

1. A method for the deposition of thin film comprising:

(a) ionizing at least one vaporized non-deposition material to form a flux comprising ions and neutral fragments of such vaporized non-deposition material;

(b) extracting from said flux a primary energetic ion beam consisting essentially of ions of vaporized non-deposition material;

(c) accelerating said primary energetic ion beam of vaporized non-deposition material to an energy level of at least 1 Kev and directing said primary energetic ion beam into a deposition chamber containing a substrate selected from the group consisting of metals, glass, and polymers, said deposition chamber containing also a vaporized deposition material comprising at least one hydrocarbon monomer and an electric field directed toward said substrate;

(d) passing said primary energetic ion beam of non-deposition material through said vaporized deposition material whereby such vaporized deposition material is ionized by interaction with said primary energetic ion beam of non-deposition material, said ions of vaporized deposition material being secondary ions which, under the influence of the aforementioned electric field, are energized and directed toward the surface of said substrate; and

(e) coimpinging said primary energetic ion beam of non-deposition material and secondary ions of vaporized deposition material against a surface of said substrate for a time sufficient to implant at least a portion of said ions of vaporized deposition material into said substrate and to form a thin film comprising a hydrocarbon polymer in and on such substrate, such film being merged into and with ions of vaporized deposition material and the atoms of said substrate.

2. A method according to claim 1 wherein said deposited film comprises a polymer of a saturated hydrocarbon having at least one carbon atom.

3. A method according to claim 1 wherein said deposited film comprises a polymer of an unsaturated hydrocarbon having at least two carbon atoms.

5. A method according to claim 1 wherein said deposited film comprises a polymer of a saturated hydrocarbon having at least one carbon atom.

4. A method for the deposition of thin film comprising:

(a) ionizing at least one vaporized deposition material to form a flux comprising ions and neutral fragments of such vaporized deposition material;

(b) extracting from said flux a primary energetic ion beam consisting essentially of ions of vaporized deposition material;

(c) accelerating said primary energetic ion beam of vaporized deposition material to an energy level of at least 1 Kev and directing said primary energetic ion beam into a deposition chamber containing a substrate selected from the group consisting of metals, glass, and polymers, said deposition chamber containing also a vaporized deposition material comprising at least one hydrocarbon monomer and an electric field directed toward said substrate;

(d) passing said primary energetic ion beam of deposition material through said vaporized deposition material whereby such vaporized deposition material is ionized by interaction with said primary energetic ion beam of deposition material, said ions of this vaporized deposition material being secondary ions which, under the influence of the aforementioned electric field, are energized and directed toward a surface of said substrate; and

(e) coimpinging said primary energetic ion beam of deposition material and secondary ions of vaporized deposition material against a surface of said substrate for a time sufficient to implant at least a portion of any ions of deposition material whether from the primary energetic ion beam of deposition material or from the secondary ions of vaporized deposition material into said substrate and to form a thin film comprising a hydrocarbon polymer in and on such substrate, such film being merged into and with ions of vaporized deposition material and the atoms of said substrate.

6. A method according to claim 4 wherein said deposited film comprises a polymer of an unsaturated hydrocarbon having at least two carbon atoms.