Pattern forming apparatus

• US 4,480,910 A
• Filed: 03/15/1982
• Issued: 11/06/1984
• Est. Priority Date: 03/18/1981
• Status: Expired due to Term

• Current Assignee: Hitachi, Ltd.
• Original Assignee: Hitachi, Ltd.
• Inventors: Hosaka, Sumio, Kuniyoshi, Shinji, Harada, Tatsuo, Kawamura, Yoshio, Kurosaki, Toshiei, Takanashi, Akihiro, Kondo, Yataro, Akeyama, Masamoto
• Primary Examiner(s): Hayes, Monroe H.
• Application Number:
  US06/358,436
• Time in Patent Office: 967 Days
• Field of Search: 355/52, 355/30, 355/75, 355/27, 352/5, 354/195
• US Class Current: 355/30
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70241 Optical aspects of refractive lens systems, i.e. comprising only refractive elements
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).

Claims

1. A pattern forming apparatus for projecting a semiconductor device pattern, which is formed on a reticle, upon a photoresist layer on a substrate, comprising:

an illumination system for illuminating said pattern to project an optical pattern image;

a reduction lens system including at least one lens for projecting said optical pattern image at a certain reduction ratio upon the photoresist layer formed on the substrate for exposing the photoresist layer;

liquid sustaining means for filling a gap between said at least one lens of said reduction lens system and said photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one), whereby the resolution of the pattern forming apparatus including the reduction lens system is improved with respect to a pattern forming apparatus in which the gap is not filled with a liquid; and

pattern detector means for detecting the alignment of patterns between said reticle and said substrate by light reflected from said substrate and transmitted through said photoresist layer, said liquid and said reduction lens system to be incident on said pattern detector means, the refractive index of said liquid being substantially equal to the refractive index of a material of said photoresist layer so that the light incident on said pattern detector means is not influenced by unevenness of said photoresist layer.

2. A pattern forming apparatus according to claim 1, wherein said pattern detector means is interposed between said illumination system and said reticle.

3. A pattern forming apparatus according to claim 1, wherein said substrate comprises a semiconductor substrate.

4. A pattern forming apparatus according to claim 1, wherein said liquid sustaining means comprises a nozzle for supplying said liquid, said nozzle being disposed at a position below said reduction lens system for enabling the flow of said liquid along the optical path of said reduction lens system.

5. A pattern forming apparatus according to claim 4, wherein said nozzle is positioned for directly supplying said liquid to the optical path of said reduction lens system and in a direction extending transversely to the optical path.

6. A pattern forming apparatus according to claim 1, wherein said liquid is trichlorotrifluoroethane or chlorobenzene.

7. A pattern forming apparatus for projecting a pattern formed on a reticle onto a photoresist layer formed on a substrate, comprising illuminating means for illuminating the pattern to project an optical pattern image, and image forming optic means having a numerical aperture, the image forming optic means including lens means having at least one reduction lens for projecting the optical pattern image at a predetermined reduction ratio onto the photoresist layer formed on the substrate for exposing the photoresist layer, liquid sustaining means for filling a gap between the at least one reduction leans and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one) for enabling the optical pattern image to be projected onto the photoresist layer with improved resolution of the image forming optic means of the pattern forming apparatus by varying the numerical aperture of the image forming optic means with respect to an image forming optic means in which the gap is not filled with a liquid, and pattern detector means for detecting the alignment of patterns between the reticle and the substrate by light reflected from the substrate and incident upon the pattern detector means along a path through the photoresist layer, the liquid and the lens means, the refractive index of the liquid being substantially equal to a refractive index of a material of the photoresist layer so that the light incident upon the photodetector means is not influenced by unevenness of the photoresist layer and substantially no error occurs in the pattern detection alignment.

8. A pattern forming apparatus according to claim 7, wherein the pattern formed on the reticle is a semiconductor device pattern.

9. A pattern forming apparatus according to claim 7, wherein the pattern detector means is interposed between the illumination means and the reticle.

10. A pattern forming apparatus according to claim 7, wherein the substrate comprises a semiconductor substrate.

11. A pattern forming apparatus according to claim 7, wherein the liquid sustaining means comprises a nozzle for supplying the liquid, the nozzle being disposed at a position below the at least one reduction lens for enabling the flow of the liquid along the optical path of the at least one reduction lens.

12. A pattern forming apparatus according to claim 11, wherein the liquid sustaining means further includes casing means for at least partially surrounding the at least one reduction lens and extending in the direction of at least one reduction lens, the nozzle being disposed in the casing means.

13. A pattern forming apparatus according to claim 12, wherein the nozzle is disposed in the casing means for directly supplying the liquid to the optical path of the at least one reduction lens and in a direction extending transversely to the optical path.

14. A pattern forming apparatus according to claim 7, wherein the liquid is trichlorotrifluoroethane or chlorobenzene.

15. A pattern forming apparatus according to claim 7, wherein the numerical aperture of the image forming optic means is determined by n sin θ

where n is the refractive index of the liquid and sin θ

is the value of the at least one reduction lens, the resolution of the image forming optic means being inversely proportional to the numerical aperture.