Support and anchoring mechanism for membranes in selectively responsive field effect devices
First Claim
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1. In a system employing a selectively reactive membrane overlying a specified gate region of a field effect device, the improvement comprising:
- a substantially nonreactive mesh structure spaced away from but overlying said specified region, wherein said mesh spans and encloses said gate region, is affixed to said device about the periphery of said region, and forms a void, open through said mesh, for location of a membrane; and
a membrane integrally located within said void and through openings in said mesh on the outside of said mesh.
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Abstract
In the formation of a chemically sensitive field effect device, prior to formation of the gate membrane, an aluminum pad is disposed over the gate, and a polyimide layer is disposed thereover. Photoresist and etching steps produce openings in the polyimide to form a gridwork which is anchored to the device on the periphery of the gate. The aluminum layer is etched completely away, forming a void defined by the suspended polyimide mesh on one side, and the gate insulator on the other. Polymeric membrane is formed in the void by insertion in liquid form.
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Citations
2 Claims
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1. In a system employing a selectively reactive membrane overlying a specified gate region of a field effect device, the improvement comprising:
- a substantially nonreactive mesh structure spaced away from but overlying said specified region, wherein said mesh spans and encloses said gate region, is affixed to said device about the periphery of said region, and forms a void, open through said mesh, for location of a membrane; and
a membrane integrally located within said void and through openings in said mesh on the outside of said mesh. - View Dependent Claims (2)
- a substantially nonreactive mesh structure spaced away from but overlying said specified region, wherein said mesh spans and encloses said gate region, is affixed to said device about the periphery of said region, and forms a void, open through said mesh, for location of a membrane; and
Specification
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Current AssigneeCritikon Co. LLC (GE Aerospace)
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Original AssigneeCritikon, Inc. (Johnson & Johnson)
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InventorsBlackburn, Gary F.
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Primary Examiner(s)Tung, T.
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Application NumberUS06/457,818Time in Patent Office691 DaysField of Search204/416, 204/418, 204/419, 204/403, 427/82, 357/23 R, 357/23 MG, 357/25, 357/71US Class Current204/416CPC Class CodesG01N 27/414 Ion-sensitive or chemical f...
