Method of fabricating a multi-layer type semiconductor device including crystal growth by spirally directing energy beam
First Claim
1. A method of fabricating a multilayer-type semiconductor device comprising the steps of:
- forming a first-layer semiconductor element on the surface of a semiconductor substrate;
forming at least one rectangular opening in an insulating film located on a scribe line of said semiconductor substrate to expose said semiconductor substrate through said opening, depositing a polycrystal semiconductor film on said insulating film and the semiconductor substrate exposed through said opening;
irradiating an energy beam on said polycrystal semiconductor film spirally relative to said polycrystal substrate, in such a manner that said beam passes said at least one opening during one revolution, thereby to crystallize said polycrystal semiconductor film, the diameter of the irradiated energy beam being larger than the maximum length of the opening, the semiconductor substrate exposed through said opening serving to provide a seed crystal for crystallization of said polycrystal semiconductor film; and
forming a second-layer semiconductor element on said crystallized layer.
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Accused Products
Abstract
A method of producing a superior semiconductor crystallized layer rapidly on a semiconductor substrate with the surface thereof covered with an insulating film is disclosed. An opening, desirably formed by at least two insulating films, is formed at an intersection of scribe lines of the semiconductor substrate. A polycrystal semiconductor film is formed on the insulating films and the opening, after which an energy beam is irradiated spirally on the polycrystal semiconductor film in such a manner that the beam passes at least one opening during each rotation thereof thereby to transform the polycrystal semiconductor film into a crystallized layer for forming a semiconductor element.
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Citations
10 Claims
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1. A method of fabricating a multilayer-type semiconductor device comprising the steps of:
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forming a first-layer semiconductor element on the surface of a semiconductor substrate; forming at least one rectangular opening in an insulating film located on a scribe line of said semiconductor substrate to expose said semiconductor substrate through said opening, depositing a polycrystal semiconductor film on said insulating film and the semiconductor substrate exposed through said opening; irradiating an energy beam on said polycrystal semiconductor film spirally relative to said polycrystal substrate, in such a manner that said beam passes said at least one opening during one revolution, thereby to crystallize said polycrystal semiconductor film, the diameter of the irradiated energy beam being larger than the maximum length of the opening, the semiconductor substrate exposed through said opening serving to provide a seed crystal for crystallization of said polycrystal semiconductor film; and forming a second-layer semiconductor element on said crystallized layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of fabricating a multilayer-type semiconductor device comprising the steps of:
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forming a first-layer semiconductor element on the surface of each of a plurality of semiconductor substrates disposed on a supporting base; forming at least one rectangular opening in an insulating film located on a scribe line of said semiconductor substrate to expose said semiconductor substrate through said opening; depositing a polycrystal semiconductor film on said insulating film and the semiconductor substrate exposed through said opening; irradiating an energy beam on said polycrystal semiconductor film spirally relative to said semiconductor substrate, in such a manner that said beam passes said at least one opening during one revolution, thereby to crystallize said polycrystal semiconductor film, the diameter of the irradiated energy beam being larger than the maximum length of the opening, the semiconductor substrate exposed through said opening serving to provide a seed crystal for crystallization of said polycrystal semiconductor film; and forming a second-layer semi-conductor element on said crystallized layer.
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Specification