Method and apparatus for exposing photosensitive material

• US 4,496,216 A
• Filed: 12/30/1982
• Issued: 01/29/1985
• Est. Priority Date: 12/30/1982
• Status: Expired due to Term

• Current Assignee: Polaroid Corporation (PLR IP Holdings LLC)
• Original Assignee: Polaroid Corporation (PLR IP Holdings LLC)
• Inventors: Cowan, James J.
• Primary Examiner(s): NOT, DEFINED
• Assistant Examiner(s): NOT, DEFINED
• Application Number:
  US06/454,728
• Time in Patent Office: 761 Days
• Field of Search: 350/162.11, 350/162.17, 350/162.2, 350/3.67, 350/3.7, 350/3.81, 354/200
• US Class Current: 359/566
• CPC Class Codes: G02B 5/32 Holograms used as optical elements
• CPC Class Codes: G03F 7/2006 using coherent light; using polarised light
• CPC Class Codes: G03F 7/70408 Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Abstract

Exposure patterns are formed in photosensitive material by multiple beam laser interferometry by a method which involves exposing said photosensitive material simultaneously to at least three coherent beams of exposing radiation wherein the sources of said beams are arranged substantially symmetrically around an axis perpendicular to the plane of said photosensitive material. Preferably, surface relief patterns are formed by developing said exposed material. Apparatus for providing such multiple coherent beams is also disclosed.

Claims

1. An apparatus for simultaneously exposing a photosensitive material to at least three coherent beams of exposing radiation which comprises

a laser;

means for dividing the wavefront of said beam emanating from said laser into equal parts;

at least three mirrors reflecting said divided beams, the number of said mirrors corresponding to the number of parts of said beam, and wherein

said mirrors are located symmetrically around an axis perpendicular to the plane of the surface of said photosensitive material.

2. The apparatus of claim 1 where each of said sources are substantially equidistant from said photosensitive material.

3. The apparatus of claim 1 wherein the intensity of each of said sources is substantially the same.

4. The apparatus of claim 1 which includes three coherent beams.

5. The apparatus of claim 1 which includes four coherent beams.

6. The apparatus of claim 1 wherein said photosensitive material is a positive photoresist.

7. The apparatus of claim 1 wherein said photosensitive material is a negative photoresist.

8. The apparatus of claim 1 wherein said photosensitive material is carried on a light transmitting base and said exposure is made through said base.

9. An apparatus for simultaneously exposing a photosensitive material to at least three coherent beams of exposing radiation which comprises

a laser;

means for dividing the amplitude of the beam emanating from said laser into at least three equal parts;

separately expanding each of said divided beams by expansion lenses to impinge upon said photosensitive material;

whereby said expansion lenses are arranged symmetrically around an axis perpendicular to the plane of the surface of said photosensitive material.

10. The apparatus of claim 9 where each of said sources are substantially equidistant from said photosensitive material.

11. The apparatus of claim 9 wherein the intensity of each of said sources is substantially the same.

12. The apparatus of claim 9 which includes three coherent beams.

13. The apparatus of claim 9 which includes four coherent beams.

14. The apparatus of claim 9 wherein said photosensitive material is a positive photoresist.

15. The apparatus of claim 9 wherein said photosensitive material is a negative photoresist.

16. The apparatus of claim 9 wherein said photosensitive material is carried on a light transmitting base and said exposure is made through said base.