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Apparatus and method for photolithography with phase conjugate optics

  • US 4,496,222 A
  • Filed: 05/01/1984
  • Issued: 01/29/1985
  • Est. Priority Date: 12/21/1981
  • Status: Expired due to Term
First Claim
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1. A system for producing a reduced image on a surface sensitive electromagnetic radiation comprising:

  • (a) an emitting device producing a beam of coherent electromagnetic radiation;

    (b) a beam splitter incident to said beam separating said beam into a power beam and an imaging beam;

    (c) a mask incident to said imaging beam with said original image thereon to amplitude modulate said imaging beam to form an imaged beam;

    (d) a convergence device incident to said power beam to produce a converging power beam;

    (e) a divergence device incident to said converging power beam to produce a diverging power beam being collinear and coextensive with said converging power beam;

    (f) a nonlinear medium incident to said converging power beam, said diverging power beam, and said imaged beam to produce a phase conjugated beam; and

    (g) a target object having said surface disposed thereon incident to said phase conjugated beam producing a reduced image.

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