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Virtual addressing for E-beam lithography

  • US 4,498,010 A
  • Filed: 05/05/1983
  • Issued: 02/05/1985
  • Est. Priority Date: 05/05/1983
  • Status: Expired due to Term
First Claim
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1. In the fabrication of integrated circuits in a particle beam apparatus, the steps in the process comprising,forming a particle beam of the desired diameter thus defining the width of a pixel,providing a resist material to be irradiated by said beam on a substrate,forming pixels by directing said beam onto said resist material,controlling said beam as it forms said pixels to form a plurality of adjacent lines of pixels which lines define a feature of a predetermined length and width,controlling said beam as it forms said area to form pixels adjacent said feature to change said feature by approximately 1/2 a pixel width when said resist material is developed, and finally,developing said resist material.

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